公开(公告)号：US20230116381A1

公开(公告)日：2023-04-13

申请号：US17911121

申请日：2021-03-09

申请人： ASML Netherlands B.V.

发明人： Long MA ,  Zhonghua DONG ,  Te-Yu CHEN

IPC分类号： H01J37/20 ,  H01J37/28 ,  H01J37/147

摘要： Apparatuses, systems, and methods for generating a beam for inspecting a wafer positioned on a stage in a charged particle beam system are disclosed. In some embodiments, a controller may include circuitry configured to classify a plurality of regions along a stripe of the wafer by type of region, the stripe being larger than a field of view of the beam, wherein the classification of the plurality of regions includes a first type of region and a second type of region; and scan the wafer by controlling a speed of the stage based on the type of region, wherein the first type of region is scanned at a first speed and the second type of region is scanned at a second speed.

公开(公告)号：US20230123152A1

公开(公告)日：2023-04-20

申请号：US17970469

申请日：2022-10-20

申请人： ASML NETHERLANDS B.V.

发明人： Yongxin WANG ,  Zhonghua DONG ,  Rui-Ling LAI ,  Kenichi KANAI

IPC分类号： H01J37/244 ,  G01T1/24 ,  H01J37/28 ,  H01J37/285 ,  H01L31/08

摘要： A detector may be provided with an array of sensing elements. The detector may include a semiconductor substrate including the array, and a circuit configured to count a number of charged particles incident on the detector. The circuit of the detector may be configured to process outputs from the plurality of sensing elements and increment a counter in response to a charged particle arrival event on a sensing element of the array. Various counting modes may be used. Counting may be based on energy ranges. Numbers of charged particles may be counted at a certain energy range and an overflow flag may be set when overflow is encountered in a sensing element. The circuit may be configured to determine a time stamp of respective charged particle arrival events occurring at each sensing element. Size of the sensing element may be determined based on criteria for enabling charged particle counting.

公开(公告)号：US20220068590A1

公开(公告)日：2022-03-03

申请号：US17418741

申请日：2019-12-19

申请人： ASML Netherlands B.V.

发明人： Ying LUO ,  Zhonghua DONG ,  Xuehui YIN ,  Long DI ,  Nianpei DENG ,  Wei FANG ,  Lingling PU ,  Ruochong FEI ,  Bohang ZHU ,  Yu LIU

IPC分类号： H01J37/147 ,  H01J37/20 ,  H01J37/21 ,  H01J37/28

摘要： Systems and methods for irradiating a sample with a charged-particle beam are disclosed. The charged-particle beam system may comprise a stage configured to hold a sample and is movable in at least one of X-Y-Z axes. The charged-particle beam system may further comprise a position sensing system to determine a lateral and vertical displacement of the stage, and a beam deflection controller configured to apply a first signal to deflect a primary charged-particle beam incident on the sample to at least partly compensate for the lateral displacement, and to apply a second signal to adjust a focus of the deflected charged-particle beam incident on the sample to at least partly compensate for the vertical displacement of the stage. The first and second signals may comprise an electrical signal having a high bandwidth in a range of 10 kHz to 50 kHz, and 50 kHz to 200 kHz, respectively.

公开(公告)号：US20200219696A1

公开(公告)日：2020-07-09

申请号：US16648288

申请日：2018-09-14

申请人： ASML Netherlands B.V.

发明人： Yongxin WANG ,  Zhonghua DONG ,  Rui-Ling LAI

IPC分类号： H01J37/244 ,  H01L27/146

摘要： Systems and methods for implementing a detector array are disclosed. According to certain embodiments, a substrate comprises a plurality of sensing elements including a first element and a second element. The detector comprises a switching element configured to connect the first element and the second element. The switching region may be controlled based on signals generated in response to the sensing elements receiving electrons with a predetermined amount of energy.

公开(公告)号：US20200027694A1

公开(公告)日：2020-01-23

申请号：US16484106

申请日：2018-02-01

申请人： ASML Netherlands B.V.

发明人： Yongxin WANG ,  Weiming REN ,  Zhonghua DONG ,  Zhongwei CHEN

IPC分类号： H01J37/244 ,  H01J37/28

摘要： Systems and methods are provided for charged particle detection. The detection system can comprise a signal processing circuit configured to generate a set of intensity gradients based on electron intensity data received from a plurality of electron sensing elements. The detection system can further comprise a beam spot processing module configured to determine, based on the set of intensity gradients, at least one boundary of a beam spot; and determine, based on the at least one boundary, that a first set of electron sensing elements of the plurality of electron sensing elements is within the beam spot. The beam spot processing module can further be configured to determine an intensity value of the beam spot based on the electron intensity data received from the first set of electron sensing elements and also generate an image of a wafer based on the intensity value.

公开(公告)号：US20240044820A1

公开(公告)日：2024-02-08

申请号：US18484161

申请日：2023-10-10

申请人： ASML Netherlands B.V.

发明人： Kuo-Feng TSENG ,  Zhonghua DONG ,  Yixiang WANG ,  Zhong-wei CHEN

IPC分类号： G01N23/2206 ,  G01N23/2251 ,  G01N23/203

CPC分类号： G01N23/2206 ,  G01N23/2251 ,  G01N23/203 ,  G01N2223/6116 ,  G01N2223/3307

摘要： Disclosed herein is an apparatus comprising: a source configured to emit charged particles, an optical system and a stage; wherein the stage is configured to support a sample thereon and configured to move the sample by a first distance in a first direction; wherein the optical system is configured to form probe spots on the sample with the charged particles; wherein the optical system is configured to move the probe spots by the first distance in the first direction and by a second distance in a second direction, simultaneously, while the stage moves the sample by the first distance in the first direction; wherein the optical system is configured to move the probe spots by the first distance less a width of one of the probe spots in an opposite direction of the first direction, after the stage moves the sample by the first distance in the first direction.

公开(公告)号：US20210134557A1

公开(公告)日：2021-05-06

申请号：US17044840

申请日：2019-03-14

申请人： ASML Netherlands B.V.

发明人： Yongxin WANG ,  Zhonghua DONG ,  Rui-Ling LAI

IPC分类号： H01J37/244 ,  H01L27/146

摘要： Detectors and detection systems are disclosed. According to certain embodiments, a substrate comprises a plurality of sensing elements including a first plurality of the sensing elements and a second plurality of the sensing elements, and a plurality of sections configured to connect the first plurality to an output, and connect the second plurality to an output. Switching regions may be provided between the sensing elements that are configured to connect two or more sensing elements. The switching region may be controlled based on signals generated in response to the sensing elements receiving electrons with a predetermined amount of energy and/or beam intensity.

公开(公告)号：US20210043416A1

公开(公告)日：2021-02-11

申请号：US17049329

申请日：2019-03-21

申请人： ASML Netherlands B.V.

发明人： Yongxin WANG ,  Zhonghua DONG

IPC分类号： H01J37/244 ,  H01L27/146

摘要： Detectors and detection systems are disclosed. According to certain embodiments, a detector comprises a substrate comprising a plurality of sensing elements including a first sensing element and a second sensing element, wherein at least the first sensing element is formed in a triangular shape. The detector may include a switching region configured to connect the first sensing 5 element and the second sensing element. There may also be provided a plurality of sections including a first section connecting a first plurality of sensing elements to a first output and a second section connecting a second plurality of sensing elements to a second output. The section may be provided in a hexagonal shape.

公开(公告)号：US20200227229A1

公开(公告)日：2020-07-16

申请号：US16648385

申请日：2018-09-14

申请人： ASML Netherlands B.V.

发明人： Yongxin WANG ,  Zhonghua DONG ,  Rui-Ling LAI

IPC分类号： H01J37/244 ,  H01L27/146

摘要： Systems and methods for implementing a detector array are disclosed. According to certain embodiments, a substrate comprises a plurality of sensing elements including a first element and a second element. The detector comprises a switching element configured to connect the first element and the second element. The switching region may be controlled based on signals generated in response to the sensing elements receiving electrons with a predetermined amount of energy.

公开(公告)号：US20200088659A1

公开(公告)日：2020-03-19

申请号：US16574970

申请日：2019-09-18

申请人： ASML Netherlands B.V.

发明人： Long MA ,  Chih-Yu JEN ,  Zhonghua DONG ,  Peilei ZHANG ,  Wei FANG ,  Chuan LI

IPC分类号： G01N23/2251 ,  H01J37/28

摘要： An improved charged particle beam inspection apparatus, and more particularly, a particle beam apparatus for inspecting a wafer including an improved scanning mechanism for detecting fast-charging defects is disclosed. An improved charged particle beam inspection apparatus may include a charged particle beam source that delivers charged particles to an area of the wafer and scans the area. The improved charged particle beam apparatus may further include a controller including a circuitry to produce multiple images of the area over a time sequence, which are compared to detect fast-charging defects.