- 专利标题： DEFECT INSPECTION APPARATUS, METHOD FOR INSPECTING DEFECT, AND METHOD FOR MANUFACTURING PHOTOMASK BLANK
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申请号： US17712031申请日： 2022-04-01
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公开(公告)号： US20220317061A1公开(公告)日： 2022-10-06
- 发明人: Ryusei TERASHIMA , Takumi Yoshino , Tsuneo Terasawa
- 申请人： Shin-Etsu Chemical Co., Ltd.
- 申请人地址： JP Tokyo
- 专利权人： Shin-Etsu Chemical Co., Ltd.
- 当前专利权人： Shin-Etsu Chemical Co., Ltd.
- 当前专利权人地址： JP Tokyo
- 优先权： JP2021-063981 20210405
- 主分类号： G01N21/95
- IPC分类号： G01N21/95 ; G01N21/956 ; H01L21/66 ; G01N21/88
摘要：
A defect inspection apparatus has a defect detection unit 152 that acquires first defect information on a defect of a photomask blank MB as a substrate; and a comparative information acquisition unit 150 that acquires a result of comparison between predetermined defect information stored in a storage unit 155 and the first defect information.