- 专利标题： SUBSTRATE HOLDER AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER
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申请号： US17856520申请日： 2022-07-01
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公开(公告)号： US20220331862A1公开(公告)日： 2022-10-20
- 发明人: Raymond Wilhelmus Louis LAFARRE , Sjoerd Nicolaas Lambertus DONDERS , Nicolaas TEN KATE , Nina Vladimirovna DZIOMKINA , Yogesh Pramod KARADE , Elisabeth Corinne RODENBURG
- 申请人： ASML NETHERLANDS B.V.
- 申请人地址： NL Veldhoven,
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven,
- 主分类号： B22F7/06
- IPC分类号： B22F7/06 ; B23K26/354 ; B23K26/342 ; G03F7/20 ; B22F10/20 ; B22F10/00 ; B23Q3/18 ; B05D3/06 ; B05D5/00 ; B33Y10/00 ; B33Y80/00
摘要：
An object holder for a lithographic apparatus has a main body having a surface. A plurality of burls to support an object is formed on the surface or in apertures of a thin-film stack. At least one of the burls is formed by laser-sintering. At least one of the burs formed by laser-sintering may be a repair of a damaged burl previously formed by laser-sintering or another method.
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