Invention Application
- Patent Title: METHODS OF CALIBRATION OF A STEREOLITHOGRAPHY SYSTEM
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Application No.: US17729077Application Date: 2022-04-26
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Publication No.: US20220339883A1Publication Date: 2022-10-27
- Inventor: Bryan D. MORAN , Brian J. BAUMAN , Matthew Kenneth GELBER , Jordan MILLER
- Applicant: Lawrence Livermore National Security, LLC , 3D SYSTEMS, INC.
- Applicant Address: US CA Livermore; US TX Houston
- Assignee: Lawrence Livermore National Security, LLC,3D SYSTEMS, INC.
- Current Assignee: Lawrence Livermore National Security, LLC,3D SYSTEMS, INC.
- Current Assignee Address: US CA Livermore; US TX Houston
- Main IPC: B29C64/393
- IPC: B29C64/393 ; B29C64/124 ; B33Y10/00 ; B33Y50/02 ; B33Y30/00

Abstract:
Provided herein is a system for producing a product. The system generally comprises a large-area micro-stereolithography system, an optical imaging system, and a controller in communication with the large-area micro-stereolithography system and the optical imaging system. The large-area micro-stereolithography system is capable of generating the product by optically polymerizing successive layers of a curable resin at a build plane. The controller is capable of analyzing a focus level of the reference target based on the captured image; and based on the analyzing, adjusting a focus property of the projected image beam of the stereolithography system.
Public/Granted literature
- US12157275B2 Methods of calibration of a stereolithography system Public/Granted day:2024-12-03
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