Invention Application
- Patent Title: PLASMA CONFINEMENT RING, SEMICONDUCTOR MANUFACTURING APPARATUS INCLUDING THE SAME, AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE USING THE SAME
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Application No.: US17548775Application Date: 2021-12-13
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Publication No.: US20220351947A1Publication Date: 2022-11-03
- Inventor: Kuihyun YOON , Sang Ki NAM , Kwonsang SEO , Sungho JANG , Jungmin KO , Nam Kyun KIM , Tae-Hyun KIM , Seunghan BAEK , Seungbin AHN , Jungmo YANG , Changheon LEE , Kangmin JEON
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Priority: KR10-2021-0055971 20210429
- Main IPC: H01J37/32
- IPC: H01J37/32

Abstract:
A plasma confinement ring includes a lower ring, an upper ring on the lower ring, and a connection ring extended to connect the lower ring to the upper ring. The lower ring includes a lower center hole vertically penetrating the lower ring at a center of the lower ring and at least one slit penetrating the lower ring in a region outside the lower center hole. The slit is structured to pass a more amount of air or gas at a first portion closer to the center of the lower ring than at a second portion farther from the center of the lower ring.
Information query