- 专利标题： LITHOGRAPHY SYSTEM AND OPERATION METHOD THEREOF
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申请号： US17871869申请日： 2022-07-22
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公开(公告)号： US20220357677A1公开(公告)日： 2022-11-10
- 发明人: Chi-Hung LIAO , Min-Cheng WU
- 申请人： TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- 申请人地址： TW Hsinchu
- 专利权人： TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- 当前专利权人： TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- 当前专利权人地址： TW Hsinchu
- 主分类号： G03F7/20
- IPC分类号： G03F7/20
摘要：
A lithography system includes a collector having a mirror surface, a laser generator aiming at an excitation zone in front of the mirror surface of the collector, a droplet generator, and a droplet deflector operative to apply a force at a position between the droplet generator and the excitation zone.
公开/授权文献
- US11899378B2 Lithography system and operation method thereof 公开/授权日：2024-02-13
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