-
公开(公告)号：US20230161273A1
公开(公告)日：2023-05-25
申请号：US18151163
申请日：2023-01-06
发明人： Chi-Hung LIAO , Min-Cheng WU
CPC分类号： G03F7/70916 , G03F7/70033 , H05G2/005
摘要： A method includes shooting a primary droplet and a satellite droplet from a droplet generator along a common initial direction; applying a force to the primary droplet and the satellite droplet, wherein after applying the force, the primary droplet has a first deflection toward a first direction different than the common initial direction, and the satellite droplet has a second deflection toward a second direction different than the common initial direction, wherein the second deflection of the satellite droplet is greater than the first deflection of the primary droplet; and generating an extreme ultraviolet (EUV) light using an excitation laser hitting the primary droplet with the first deflection.
-
公开(公告)号：US20200020521A1
公开(公告)日：2020-01-16
申请号：US16243726
申请日：2019-01-09
发明人： Min-Cheng WU , Chi-Hung LIAO
IPC分类号： H01L21/02 , H01L21/324 , H01L21/027 , H01L21/687
摘要： A method includes transferring a wafer to a position over a wafer chuck; lifting a lifting pin through the wafer chuck to the wafer; introducing a gas to a region between the wafer and the wafer chuck through a plurality of first openings on a sidewall of the lifting pin; and lowering the lifting pin until the wafer reaches the wafer chuck.
-
公开(公告)号：US20220357677A1
公开(公告)日：2022-11-10
申请号：US17871869
申请日：2022-07-22
发明人： Chi-Hung LIAO , Min-Cheng WU
IPC分类号： G03F7/20
摘要： A lithography system includes a collector having a mirror surface, a laser generator aiming at an excitation zone in front of the mirror surface of the collector, a droplet generator, and a droplet deflector operative to apply a force at a position between the droplet generator and the excitation zone.
-
公开(公告)号：US20200033730A1
公开(公告)日：2020-01-30
申请号：US16049678
申请日：2018-07-30
发明人： Min-Cheng WU , Chi-Hung LIAO
摘要： Embodiments of the present disclosure provide a substrate measuring device in a lithography projection apparatus that provides multiple light sources having different wavelengths. In some embodiments, a lithography projection apparatus includes a substrate measuring system disposed proximate to a substrate stage, the substrate measuring system further including an emitter including multiple light sources configured to provide multiple beams of light, each of at least some of the multiple beams of light having a different wavelength, at least one optical fiber, wherein each of respective portions of the at least one optical fiber is configured to pass a respective one of the multiple beams of light, and a receiver positioned to collected light emitted from the emitter and reflected off of a substrate disposed on the substrate stage.
-
公开(公告)号：US20230118862A1
公开(公告)日：2023-04-20
申请号：US18066771
申请日：2022-12-15
发明人： Min-Cheng WU , Chi-Hung LIAO
IPC分类号： H01L21/02 , H01L21/324 , H01L21/687 , H01L21/027
摘要： A method includes transferring a wafer to a position over a wafer chuck; lifting a lifting pin through the wafer chuck to a first position to support the wafer; holding the wafer on the lifting pin using a negative pressure source in gaseous communication with an inner gas passage of the lifting pin; introducing a gas to a region between the wafer and the wafer chuck through an outer gas passage of the lifting pin, wherein in a top view of the lifting pin, the inner gas passage has a circular profile, while the outer gas passage has a ring-shape profile; and lowering the lifting to dispose the wafer over the wafer chuck.
-
公开(公告)号：US20200301292A1
公开(公告)日：2020-09-24
申请号：US16894653
申请日：2020-06-05
发明人： Min-Cheng WU , Chi-Hung LIAO
摘要： A system includes a frame, a projection lens, a wafer table, and a cleaner. The frame has an opening vertically extending through the frame. The projection lens is disposed on the frame. The wafer table is below the frame, in which the wafer table is movable along a horizontal direction. The cleaner is over the frame, in which the cleaner comprises a sticky structure movable along a vertical direction and through the opening of the frame.
-
公开(公告)号：US20200057372A1
公开(公告)日：2020-02-20
申请号：US16449184
申请日：2019-06-21
发明人： Chi-Hung LIAO , Min-Cheng WU
摘要： A method is provided. The method includes steps as follows. EUV light is generated. A collector is used to gather the EUV light onto a first optical reflector. The first optical reflector is used to reflect the EUV light to a reticle, so as to impart the EUV light with a pattern. A second optical reflector is used to reflect the EUV light with the pattern onto a wafer. The first optical reflector is rotated.
-
公开(公告)号：US20200019072A1
公开(公告)日：2020-01-16
申请号：US16164652
申请日：2018-10-18
发明人： Min-Cheng WU , Chi-Hung LIAO
摘要： A method includes moving a sticky structure to a wafer table such that a first particle on the wafer table is adhered to the sticky structure, moving the sticky structure away from the wafer table after the first particle is adhered to the sticky structure, and performing a lithography process to a wafer held by the wafer table after moving the sticky structure away from the wafer table
-
公开(公告)号：US20220334490A1
公开(公告)日：2022-10-20
申请号：US17855591
申请日：2022-06-30
发明人： Min-Cheng WU , Chi-Hung LIAO
摘要： Embodiments of the present disclosure provide a substrate measuring device in a lithography projection apparatus that provides multiple light sources having different wavelengths. In some embodiments, a lithography projection apparatus includes a substrate measuring system disposed proximate to a substrate stage, the substrate measuring system further including an emitter including multiple light sources configured to provide multiple beams of light, each of at least some of the multiple beams of light having a different wavelength, at least one optical fiber, wherein each of respective portions of the at least one optical fiber is configured to pass a respective one of the multiple beams of light, and a receiver positioned to collected light emitted from the emitter and reflected off of a substrate disposed on the substrate stage.
-
公开(公告)号：US20210341841A1
公开(公告)日：2021-11-04
申请号：US17374647
申请日：2021-07-13
发明人： Min-Cheng WU , Chi-Hung LIAO
摘要： Embodiments of the present disclosure provide a substrate measuring device in a lithography projection apparatus that provides multiple light sources having different wavelengths. In some embodiments, a lithography projection apparatus includes a substrate measuring system disposed proximate to a substrate stage, the substrate measuring system further including an emitter including multiple light sources configured to provide multiple beams of light, each of at least some of the multiple beams of light having a different wavelength, at least one optical fiber, wherein each of respective portions of the at least one optical fiber is configured to pass a respective one of the multiple beams of light, and a receiver positioned to collected light emitted from the emitter and reflected off of a substrate disposed on the substrate stage.
-
-
-
-
-
-
-
-
-
搜索结果
16 条记录 (耗时 0.019 秒)
