Invention Application
- Patent Title: HIGHLY STRETCHABLE SUPERHYDROPHOBIC THIN FILM USING INITIATED CHEMICAL VAPOR DEPOSITION AND METHOD OF PREPARING SAME
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Application No.: US17722471Application Date: 2022-04-18
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Publication No.: US20220363941A1Publication Date: 2022-11-17
- Inventor: Sung Gap IM , Myung Seok Oh , Mingyu Jeon
- Applicant: KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY
- Applicant Address: KR Daejeon
- Assignee: KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY
- Current Assignee: KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY
- Current Assignee Address: KR Daejeon
- Priority: KR10-2021-0055735 20210429
- Main IPC: C09D143/04
- IPC: C09D143/04 ; C09D5/00

Abstract:
A highly stretchable superhydrophobic thin film using initiated chemical vapor deposition is prepared by a method in which a substrate is coated with a copolymer at a nanometer thickness by allowing a fluorine monomer containing 4 to 6 fluoroalkyl groups and having a glass transition temperature of 5° C. or less to react with a crosslinking monomer on the substrate in the presence of an initiator in an initiated chemical vapor deposition reactor and thus its durability can be secured in foldable and wearable devices.
Information query
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