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1.发明申请METHOD OF FABRICATING SURFACE BODY HAVING SUPERHYDROPHOBICITY AND HYDROPHILICITY AND APPARATUS OF PREPARING THE SAME 有权制备具有超级疏水性和亲水性的表面体的方法及其制备方法公开(公告)号：US20140322455A1
公开(公告)日：2014-10-30
申请号：US14260227
申请日：2014-04-23
Inventor： Sung Gap IM , Jae Bem YOU , Youngmin YOO , Myung Seok OH
CPC classification number: D06M23/16 , B01D67/0088 , B01D67/0093 , B01D2323/04 , B05D1/60 , B05D1/62 , B05D5/04 , B05D5/083 , C08J7/00 , D06B1/02 , D06M10/025 , D06M10/10 , D06M11/38 , D06M15/277 , D06M23/06 , D06M2101/32 , D06M2101/34 , D06M2200/11 , D06M2200/12
Abstract: The present invention relates to a method of preparing a material having a superhydrophobic region and a hydrophobic region, and more particularly to a method of preparing a material having a superhydrophobic region and a hydrophobic region by preparing a superhydrophobic surface body and hydrolyzing one surface of the prepared superhydrophobic surface body using a strong base. The preparation method according to the invention is simpler than conventional preparation methods and is capable of preparing a material having opposite surface characteristics at low costs.
Abstract translation: 本发明涉及一种制备具有超疏水区域和疏水区域的材料的方法，更具体地涉及一种制备具有超疏水区域和疏水区域的材料的方法，该方法通过制备超疏水表面体并水解其中的一个表面 使用强碱制备超疏水表面体。 根据本发明的制备方法比常规制备方法更简单，并且能够以低成本制备具有相反表面特性的材料。
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2.发明申请公开(公告)号：US20250109263A1
公开(公告)日：2025-04-03
申请号：US18775413
申请日：2024-07-17
Inventor： Joo Young KIM , Sung Gap IM , Juyeon KANG , Sung-Gyu KANG , Yasutaka KUZUMOTO
Abstract: A stretchable insulating film may include a first insulating layer having stretchability and a second insulating layer on the first layer and having non-stretchability. The first insulating layer may include an elastomer and the second insulating layer may include a cyclic siloxane polymer framework. An electronic device may include the stretchable insulating film. A method of manufacturing the stretchable insulating film may include forming the first insulating layer and forming the second insulating layer. The forming the first insulating layer may include coating a composition including the elastomer or depositing the elastomer. The forming the second insulating layer may include injecting a cyclic siloxane monomer and an initiator on the first insulating layer into a reactor equipped with a heat source and performing a polymerization reaction by low-temperature vapor deposition.
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公开(公告)号：US20230422530A1
公开(公告)日：2023-12-28
申请号：US18460713
申请日：2023-09-05
Inventor： Sangsu PARK , Sung-Yool CHOI , Sung Gap IM , Sang Yoon YANG , Jungyeop OH
CPC classification number: H10K10/50 , G06N3/065 , H10K10/82 , H10K19/202 , H10K71/10 , H10K85/111 , H10K85/151
Abstract: Disclosed are a memristor device, a method of fabricating the same, a synaptic device including a memristor device, and a neuromorphic device including a synaptic device. The disclosed memristor device may comprise a first electrode, a second electrode disposed to be spaced apart from the first electrode; and a resistance changing layer including a copolymer between the first electrode and the second electrode. The copolymer may be a copolymer of a first monomer and a second monomer, and the first polymer formed from the first monomer may have a property that diffusion of metal ions is faster than that of the second polymer formed from the second monomer. The second polymer may have a lower diffusivity of metal ions as compared with the first polymer. The first monomer may include vinylimidazole (VI). The second monomer may include 1,3,5-trivinyl-1,3,5-trimethylcyclotrisiloxane (V3D3). The copolymer may include p(V3D3-co-VI).
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公开(公告)号：US20230166250A1
公开(公告)日：2023-06-01
申请号：US17918270
申请日：2021-03-31
Inventor： Young Jin CHO , Do Heung KIM , Eun Ji WOO , Won Tae JANG , Keon Woo CHOI , Sung Gap IM
CPC classification number: B01J37/0228 , C23C16/405 , C23C16/45527 , B01J37/14 , B01J21/04 , B01J23/42 , B01J35/0006
Abstract: A method for producing a metal catalyst having an inorganic film deposited thereon by means of an atomic layer deposition (ALD) process, and a metal catalyst according to the method are disclosed. More specifically, the method includes a step of inducing selective adsorption of reactants to a portion having a low coordination number on the surface of the catalyst in the ALD process, thereby being intended to induce interaction between the catalyst and an inorganic film layer and maximally secure active sites of the catalyst.
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公开(公告)号：US20220363941A1
公开(公告)日：2022-11-17
申请号：US17722471
申请日：2022-04-18
Inventor： Sung Gap IM , Myung Seok Oh , Mingyu Jeon
IPC: C09D143/04 , C09D5/00
Abstract: A highly stretchable superhydrophobic thin film using initiated chemical vapor deposition is prepared by a method in which a substrate is coated with a copolymer at a nanometer thickness by allowing a fluorine monomer containing 4 to 6 fluoroalkyl groups and having a glass transition temperature of 5° C. or less to react with a crosslinking monomer on the substrate in the presence of an initiator in an initiated chemical vapor deposition reactor and thus its durability can be secured in foldable and wearable devices.
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Patent Agency Ranking
公开(公告)号：US20240092954A1
公开(公告)日：2024-03-21
申请号：US18452831
申请日：2023-08-21
Inventor： Sung Gap IM , Seongeun KIM , Boo Seok JEONG , Nahyun PARK , Younseong SONG , Hogi KIM
IPC: C08F220/34
CPC classification number: C08F220/34 , C12N15/1006
Abstract: A disclosed polymer thin film includes a cationic polymer having a hydrolyzable side chain. The polymer thin film has a surface potential of 1 mV to 50 mV. A hydrolysis efficiency of the cationic polymer is 30% or more after reaction at 50° C. for one hour. The cationic polymer is dissolved to three-dimensionally capture nucleic acids, and releases the nucleic acids through hydrolysis. Thus, nucleic acid capturing-releasing efficiency can be improved.
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公开(公告)号：US20230153992A1
公开(公告)日：2023-05-18
申请号：US17556971
申请日：2021-12-20
Inventor： Kyoung Gyun LEE , Sung Gap IM , Seok Jae LEE , Youn Seong SONG , Yoo Min PARK , Nam Ho BAE
CPC classification number: G06T7/0012 , G06T7/77 , G06V10/753 , G01N21/6428 , G01N33/5302 , G06T2207/10056 , G06T2207/10064 , G06T2207/30242 , G06T2207/20084
Abstract: Provided are a device for a digital assay of targets according to an exemplary embodiment of the present disclosure and a method using the same. The digital assay method of targets according to the exemplary embodiment of the present disclosure includes acquiring an image for a plurality of microdroplets, predicting at least one region based on the image for the plurality of microdroplets using an artificial neural network-based prediction model configured to segment at least one region among positive microdroplets, negative microdroplets, and atypical microdroplets, with the image for the plurality of microdroplets as an input, determining a number for the plurality of microdroplets based on the at least one region, and providing quantitative data of targets based on the number for the plurality of microdroplets.
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公开(公告)号：US20220305524A1
公开(公告)日：2022-09-29
申请号：US17057681
申请日：2020-09-15
Inventor： Sung Gap IM , Doheung KIM , Wontae JANG , Keonwoo CHOI
IPC: B05D1/00
Abstract: The present invention relates to a method of preparing a polymer film using chemical vapor deposition using sulfur as an initiator (sCVD) capable of manufacturing a polymer film through polymerization of sulfur and a monomer using gas-phase sulfur as an initiator. In the manufactured polymer film, any of various monomers and sulfur can be polymerized into a copolymer, and it is possible to manufacture a polymer film having a high content of sulfur, an excellent refractive index, and excellent transmittance.
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9.发明申请公开(公告)号：US20250066935A1
公开(公告)日：2025-02-27
申请号：US18714460
申请日：2022-11-30
Inventor： Myung Seok OH , Joung Hoon PARK , Do Heung KIM , Eui-Duk KIM , Sarang PARK , Hyojin JEON , Sung Gap IM , Jin RYU
IPC: C25B11/069 , C25B9/23 , C25B11/032 , C25B11/056
Abstract: The present invention relates to a gas diffusion layer for anion exchange membrane electrolysis which is hydrophilic and has alkali resistance, and further maintains high porosity and low electrical resistance, and a manufacturing method therefor.
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10.发明公开公开(公告)号：US20230405574A1
公开(公告)日：2023-12-21
申请号：US18249083
申请日：2021-10-13
Inventor： Young Jin CHO , Do Heung KIM , Myung Seok OH , Sung Gap IM , Wontae JANG , Keonwoo CHOI
IPC: B01J37/02 , B01J23/42 , B01J21/04 , B01J21/06 , B01J35/02 , B01J37/12 , C23C16/455 , C23C16/06 , C23C16/44
CPC classification number: B01J37/0244 , B01J37/0228 , B01J23/42 , B01J21/04 , B01J21/063 , B01J35/026 , B01J37/12 , C23C16/45527 , C23C16/06 , C23C16/45555 , C23C16/4408
Abstract: The present disclosure relates to a method for preparing a metal catalyst deposited with a layer film by ALD process and a metal catalyst thereof. More specifically, the present disclosure is intended to inhibit sintering of catalyst particles to prevent activity decrease, thus stably maintaining high activity, and simultaneously, providing heat stability, by layer-by-layer deposition of a layer film with alternation of different inorganic films on the surface of a metal catalyst in an ALD process.
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