Invention Application
- Patent Title: OPTIMIZATION OF A DIGITAL PATTERN FILE FOR A DIGITAL LITHOGRAPHY DEVICE
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Application No.: US17636998Application Date: 2019-09-23
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Publication No.: US20220367438A1Publication Date: 2022-11-17
- Inventor: Chung-Shin KANG , Thomas L. LAIDIG , Yinfeng DONG , Yao-Cheng YANG , Chen-Chien HUNG , Shivaraj Gururaj KAMALAPURA , Tsaichuan KAO
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- International Application: PCT/US2019/052449 WO 20190923
- Main IPC: H01L27/02
- IPC: H01L27/02 ; G03F7/20 ; G06F30/398

Abstract:
A digital pattern generation system comprises a memory and a controller. The controller is coupled the memory and is configured to remove redundant cells from a digital pattern file, generate a first updated digital pattern file and compare the first updated digital pattern file with the digital pattern file. Further a number of vertexes of a first arc of the first updated digital pattern file is reduced to generate a second updated digital pattern file. Additionally, a first cell of the second updated digital pattern file is replaced with an alternative version of the first cell to generate a third updated digital pattern file. Further, one or more polygons within the third updated digital pattern file is converted to one or more quad polygons to generate an optimized digital pattern file.
Public/Granted literature
- US12302641B2 Optimization of a digital pattern file for a digital lithography device Public/Granted day:2025-05-13
Information query
IPC分类: