Invention Application
- Patent Title: FIELD PLATE STRUCTURES FOR GAN HIGH VOLTAGE TRANSISTORS
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Application No.: US17829905Application Date: 2022-06-01
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Publication No.: US20220384586A1Publication Date: 2022-12-01
- Inventor: Pil Sung Park , Daniel M. Kinzer
- Applicant: Navitas Semiconductor Limited
- Applicant Address: IE Dublin
- Assignee: Navitas Semiconductor Limited
- Current Assignee: Navitas Semiconductor Limited
- Current Assignee Address: IE Dublin
- Main IPC: H01L29/40
- IPC: H01L29/40 ; H01L29/778 ; H01L29/20

Abstract:
Field plate structures for gallium nitride (GaN) high voltage transistors are disclosed. In one aspect, a transistor includes a GaN substrate, a source region formed on the GaN substrate, a drain region formed on the GaN substrate and separate from the source region, a gate region formed between the source region and the drain region, a pedestal formed on the GaN substrate and positioned between the gate region and the drain region, and a field plate electrically coupled to the source region, where the field plate extends from a proximal region positioned between the source region and the pedestal, towards the drain region, where at least a portion of the field plate overlaps at least a portion of the pedestal.
Information query
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