Invention Application
- Patent Title: CYCLIC DEPOSITION METHODS FOR FORMING METAL-CONTAINING MATERIAL AND FILMS AND STRUCTURES INCLUDING THE METAL-CONTAINING MATERIAL
-
Application No.: US17891851Application Date: 2022-08-19
-
Publication No.: US20220389583A1Publication Date: 2022-12-08
- Inventor: Katja Väyrynen , Timo Hatanpää , Anton Vihervaara , Mikko Ritala , Markku Leskelä
- Applicant: ASM IP Holding B.V.
- Applicant Address: NL Almere
- Assignee: ASM IP Holding B.V.
- Current Assignee: ASM IP Holding B.V.
- Current Assignee Address: NL Almere
- Main IPC: C23C16/455
- IPC: C23C16/455 ; C23C16/08 ; C23C16/18
Abstract:
A method of depositing a metal-containing material is disclosed. The method can include use of cyclic deposition techniques, such as cyclic chemical vapor deposition and atomic layer deposition. The metal-containing material can include intermetallic compounds. A structure including the metal-containing material and a system for forming the material are also disclosed.
Public/Granted literature
Information query
IPC分类:
