- 专利标题: METHOD FOR INSPECTING A SPECIMEN AND CHARGED PARTICLE BEAM DEVICE
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申请号: US17770576申请日: 2019-10-21
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公开(公告)号: US20220392735A1公开(公告)日: 2022-12-08
- 发明人: Pieter Kruit , Ron Naftali , Jürgen Frosien , Ralf Schmid , Benjamin John Cook , Roman Barday , Dieter Winkler
- 申请人: Applied Materials, Israel Ltd. , TECHNISCHE UNIVERSITEIT DELFT
- 申请人地址: IL Rehovot; NL CN Delft
- 专利权人: Applied Materials, Israel Ltd.,TECHNISCHE UNIVERSITEIT DELFT
- 当前专利权人: Applied Materials, Israel Ltd.,TECHNISCHE UNIVERSITEIT DELFT
- 当前专利权人地址: IL Rehovot; NL CN Delft
- 国际申请: PCT/EP2019/078504 WO 20191021
- 主分类号: H01J37/147
- IPC分类号: H01J37/147 ; H01J37/05 ; H01J37/20 ; H01J37/12 ; H01J37/28
摘要:
A charged particle beam device for irradiating or inspecting a specimen is described. The charged particle beam device includes a charged particle beam source for generating a primary charged particle beam and a multi-aperture lens plate having a plurality of apertures for forming four or more primary. Two or more electrodes having one opening, e.g. having one opening each, for the primary charged particle beam or the four or more primary beamlets are provided. The charged particle beam device further includes a collimator for deflecting a first primary beamlet, a second primary beamlet, a third primary beamlet, and a fourth primary beamlet of the four or more primary beamlets with respect to each other. The charged particle beam device further includes an objective lens unit having three or more electrodes, each electrode having openings for the four or more primary beamlets.
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