- 专利标题: COMPOSITIONS AND METHODS FOR PROTECTING COATINGS FROM THE DELETERIOUS EFFECTS OF EXPOSURE TO UV-C LIGHT
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申请号: US17849614申请日: 2022-06-25
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公开(公告)号: US20220411646A1公开(公告)日: 2022-12-29
- 发明人: Lei ZHANG , Ram B. GUPTA , Jian-Yang CHO , Jerry Mon Hei ENG , Xin LI
- 申请人: CYTEC INDUSTRIES INC.
- 申请人地址: US NJ Princeton
- 专利权人: CYTEC INDUSTRIES INC.
- 当前专利权人: CYTEC INDUSTRIES INC.
- 当前专利权人地址: US NJ Princeton
- 主分类号: C09D5/32
- IPC分类号: C09D5/32 ; C09D175/04 ; C09D133/08 ; C09D7/48 ; C09D7/61 ; C07D251/14
摘要:
Coating compositions having a polymeric binder and a stabilizer composition including at least one of a UV absorber, a hindered amine light stabilizer (HALS), or an inorganic UV blocker are provided herein, wherein said coating compositions are more resistant to discoloration when exposed to UV-C (190-280 nm) light compared to the coating compositions in the absence of the stabilizer composition. Thus, a method of stabilizing a coating composition against the deleterious effects of UV-C (190-280 nm) light includes adding to the coating composition an effective amount of such a stabilizer composition, wherein the coating composition is made more resistant to discoloration when exposed to UV-C (190-280 nm) light compared to the coating composition in the absence of the stabilizer composition. Coated articles can be made from the coating composition, and methods of making stabilized coating films include adding the stabilizer composition to the coating composition.
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