公开(公告)号：US20220169829A1

公开(公告)日：2022-06-02

申请号：US17535089

申请日：2021-11-24

Applicant: CYTEC INDUSTRIES INC.

Inventor： Jerry Mon-Hei ENG ,  Ram B. GUPTA ,  Xin LI ,  Jian-Yang CHO ,  Kyle O'CONNOR ,  Thomas SANTAMARIA ,  Min WANG

IPC: C08K5/00 ,  C08L23/06 ,  C08L23/12 ,  C08K5/132 ,  C08K5/529 ,  C08K5/3492 ,  C08K5/3435 ,  C08K5/3462

Abstract: Polymer compositions for making stabilized polymeric articles that are resistant to at least one deleterious effect of discoloration, cracking, or crazing upon exposure to UV-C (190-280 nm) light are provided herein, wherein the polymer compositions include: (i) an organic polymeric material; and (ii) a stabilizer composition comprising: an antioxidant selected from the group consisting of hindered phenols, phosphites and phosphonites, and mixtures thereof; and a light stabilizer selected from the group consisting of hindered amine light stabilizers (HALS), UV absorbers (UVA), hindered benzoates, and mixtures thereof, even where barium compounds (such as barium salts) are absent from the stabilizer composition, and with the proviso that the HALS is not bis(2,2,6,6,-tetramethyl-4-piperidyl) sebacate (TINUVIN™ 770) alone. At least one of reduced discoloration, cracking, or crazing upon exposure to UV-C light is associated with the use of the light stabilizer in combination with the antioxidant compared to the antioxidant in the absence of the light stabilizer. Methods of stabilizing organic polymeric materials against the deleterious effects of UV-C light by adding to the organic polymeric materials the antioxidant and the light stabilizer, are also provided.

公开(公告)号：US20160145427A1

公开(公告)日：2016-05-26

申请号：US14947163

申请日：2015-11-20

Applicant: Cytec Industries Inc.

Inventor： J. Mon Hei ENG ,  Joseph KOZAKIEWICZ ,  Ram B. GUPTA ,  Jian-Yang CHO ,  Roderick G. RYLES ,  Fadi KHAWAM

IPC: C08L23/12 ,  C08K5/132 ,  C08L77/06 ,  C08K5/1535 ,  C08K5/06 ,  C08L23/06 ,  C08K5/3492 ,  C08K5/134

CPC classification number: C08L23/12 ,  C08K5/005 ,  C08K5/06 ,  C08K5/132 ,  C08K5/1345 ,  C08K5/1535 ,  C08K5/3475 ,  C08K5/3492 ,  C08K5/34926 ,  C08K5/357 ,  C08L23/06 ,  C08L77/06 ,  C08L2201/08 ,  C08L2207/062 ,  C08L2310/00

Abstract: Stabilizer compositions having a stabilizing amount of at least one co-active agent; and a stabilizing amount of any one or more ultraviolet light absorber chosen from an ortho-hydroxyphenyl triazine, an ortho-hydroxy benzophenone, or an ortho-hydroxyphenyl benzotriazole, optionally in combination with a stabilizing amount of a hindered amine light stabilizer, are provided herein, along with masterbatch concentrates containing same, and processes for using same for stabilizing organic materials to protect against light and thermal degradation due to exposure to UV irradiation.

Abstract translation: 具有稳定量的至少一种共活性剂的稳定剂组合物; 并且稳定量的任何一种或多种选自邻羟基苯基三嗪，邻羟基二苯甲酮或邻羟基苯基苯并三唑的紫外光吸收剂，任选地与稳定量的受阻胺光稳定剂组合在一起提供 ，以及含有它们的母料浓缩物，以及使用它们用于稳定有机材料以防止由于暴露于UV照射引起的光和热降解的方法。

公开(公告)号：US20220396691A1

公开(公告)日：2022-12-15

申请号：US17365172

申请日：2021-07-01

Applicant: Cytec Industries Inc.

Inventor： J. Mon Hei ENG ,  Joseph KOZAKIEWICZ ,  Ram B. GUPTA ,  Jian-Yang CHO ,  Roderick G. RYLES ,  Fadi KHAWAM

IPC: C08L23/12 ,  C08K5/3492 ,  C08K5/00 ,  C08K5/3475 ,  C08K5/357 ,  C08K5/06 ,  C08K5/132 ,  C08K5/134 ,  C08K5/1535 ,  C08L23/06 ,  C08L77/06

Abstract: Stabilizer compositions having a stabilizing amount of at least one co-active agent; an ultraviolet light absorber chosen from an ortho-hydroxy benzophenone, and/or an ortho-hydroxyphenyl benzotriazole; and a hindered amine light stabilizer, are provided herein, along with masterbatch concentrates containing same, and processes for using same for stabilizing polymeric organic materials to protect against light and thermal degradation due to exposure to UV irradiation.

公开(公告)号：US20220411646A1

公开(公告)日：2022-12-29

申请号：US17849614

申请日：2022-06-25

Applicant: CYTEC INDUSTRIES INC.

Inventor： Lei ZHANG ,  Ram B. GUPTA ,  Jian-Yang CHO ,  Jerry Mon Hei ENG ,  Xin LI

IPC: C09D5/32 ,  C09D175/04 ,  C09D133/08 ,  C09D7/48 ,  C09D7/61 ,  C07D251/14

Abstract: Coating compositions having a polymeric binder and a stabilizer composition including at least one of a UV absorber, a hindered amine light stabilizer (HALS), or an inorganic UV blocker are provided herein, wherein said coating compositions are more resistant to discoloration when exposed to UV-C (190-280 nm) light compared to the coating compositions in the absence of the stabilizer composition. Thus, a method of stabilizing a coating composition against the deleterious effects of UV-C (190-280 nm) light includes adding to the coating composition an effective amount of such a stabilizer composition, wherein the coating composition is made more resistant to discoloration when exposed to UV-C (190-280 nm) light compared to the coating composition in the absence of the stabilizer composition. Coated articles can be made from the coating composition, and methods of making stabilized coating films include adding the stabilizer composition to the coating composition.

公开(公告)号：US20190264084A1

公开(公告)日：2019-08-29

申请号：US16286875

申请日：2019-02-27

Applicant: Cytec Industries Inc.

Inventor： Joseph KOZAKIEWICZ ,  J. Mon-Hei ENG ,  Jian-Yang CHO ,  Ram B. GUPTA ,  Robert HOPPER

IPC: C09K3/22 ,  C08K5/06 ,  C08K5/3475 ,  C08K5/3492 ,  C08K5/132 ,  C08K5/357 ,  C08K5/3435 ,  C08K5/3462 ,  C08K5/134 ,  C08K5/13 ,  C08K5/523 ,  C08K5/527 ,  C08K5/5393 ,  C08K5/38 ,  C08K5/17 ,  C08K5/20

Abstract: Granular stabilizer compositions including concentrated blends of one or more polymer additive, and one or more co-active agent, which compositions are low-dusting and substantially free of a carrier polymer resin are disclosed herein, along with process for making the stabilizer compositions, and uses of such stabilizer compositions for providing enhanced protection of polymer resins against deleterious effects from air (oxygen), residual catalyst, mechanical stress, heat, and light.