Invention Application
- Patent Title: SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
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Application No.: US17730603Application Date: 2022-04-27
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Publication No.: US20230004084A1Publication Date: 2023-01-05
- Inventor: Katsuhiro KOMURO , Koji ICHIKAWA
- Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee Address: JP Tokyo
- Priority: JP2021-078377 20210506
- Main IPC: G03F7/004
- IPC: G03F7/004 ; C07D307/00 ; C07D333/76 ; C07D321/10 ; C07D409/12 ; C07D493/10

Abstract:
Disclosed are a salt represented by formula (I), an acid generator, and a resist composition: wherein R1, R2 and R3 each represent a hydroxy group, *—O—R10, *—O-L10-CO—O—R10, etc.; L10 represents an alkanediyl group; R10 represents an acid-labile group; R4 to R9 each represent a halogen atom, a haloalkyl group, etc.; A1, A2 and A3 each represent a hydrocarbon group, etc.; m1 and m7 represent an integer of 0 to 5, m2 to m6, m8 and m9 represent an integer of 0 to 4, 0≤m1+m7≤5, 0≤m2+m8≤4, 0≤m3+m9≤4, and at least one of m1, m2 and m3 represents an integer of 1 or more; X4 represents a single bond, —CH2—, etc.; and Al− represents an organic anion.
Information query
IPC分类: