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公开(公告)号：US20230152691A1
公开(公告)日：2023-05-18
申请号：US17821820
申请日：2022-08-24
发明人： Katsuhiro KOMURO , Saki KATO , Koji ICHIKAWA
IPC分类号： G03F7/004 , C07D307/68 , C07D307/00 , C07D307/56 , C07D321/10 , C07D333/40 , C07D333/28
CPC分类号： G03F7/0045 , C07D307/68 , C07D307/00 , C07D307/56 , C07D321/10 , C07D333/40 , C07D333/28
摘要： Disclosed are a salt represented by formula (I), an acid generator, and a resist composition including the same:
wherein R4 to R9 each represent a halogen atom, a haloalkyl group, etc., A1, A2 and A3 each represent a hydrocarbon group, the group may have a substituent, —CH2— in the group may be replaced by —O—, —CO—, —S—, etc., X4, X5 and X6 each represent —O— or —S—, m1 represents an integer of 1 to 5, m2, m3, m8 and m9 represent an integer of 0 to 5, m4, m5 and m6 represent an integer of 0 to 3, m7 represents an integer of 0 to 4, 1≤m1+m7≤5, 0≤m2+m8≤5, 0≤m3+m9≤5, and AI− represents an organic anion.-
公开(公告)号：US20230028443A1
公开(公告)日：2023-01-26
申请号：US17825280
申请日：2022-05-26
发明人： Katsuhiro KOMURO , Koji ICHIKAWA
IPC分类号： G03F7/004 , G03F7/039 , G03F7/038 , C07D307/00 , C07C43/225 , C07D321/10 , C07C69/94 , C07C381/12
摘要： Provided are a salt capable of producing a resist pattern with satisfactory CD uniformity (CDU), an acid generator, and a resist composition comprising the same. Disclosed are a salt represented by formula (I), an acid generator, and a resist composition comprising the same: wherein R4, R5, R7 and R8 each represent a halogen atom, a haloalkyl group or a hydrocarbon group; A1 and A2 each represent a hydrocarbon group, the hydrocarbon group may have a substituent, and —CH2— included in the hydrocarbon group may be replaced by —O—, —CO—, —S— or —SO2—; ml represents an integer of 1 to 5, m2, m4, m5 and m8 represent an integer of 0 to 5, m7 represents an integer of 0 to 4, 1≤m1+m7≤5, 0≤m2+m8≤5; and AI− represents an organic anion.
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公开(公告)号：US20210387944A1
公开(公告)日：2021-12-16
申请号：US17246868
申请日：2021-05-03
发明人： Katsuhiro KOMURO , Koji ICHIKAWA
IPC分类号： C07C309/17 , G03F7/20 , G03F7/004 , C07D321/06
摘要： A salt represented by formula (I), a generator and a resist composition: wherein R1 and R2 each independently represent an iodine atom, a fluorine atom or an alkyl fluoride group having 1 to 6 carbon atoms; R4, R5, R7 and R8 each independently represent a halogen atom, a hydroxy group, a haloalkyl group having 1 to 12 carbon atoms or an alkyl group having 1 to 12 carbon atoms, —CH2— included in the haloalkyl group and the alkyl group may be replaced by —O—, —CO—, —S— or —SO2−; X1 and X2 each independently represent an oxygen atom or a sulfur atom; m1 represents 1 to 5, m2 and m8 represent 0 to 5, and m4, m5 and m7 represent an integer of 0 to 4, in which 1≤m1+m7≤5, 0≤m2+m8≤5; and AI− represents an organic anion.
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公开(公告)号：US20210371376A1
公开(公告)日：2021-12-02
申请号：US17323330
申请日：2021-05-18
发明人： Katsuhiro KOMURO , Jun OGUMA , Koji ICHIKAWA
IPC分类号： C07C309/17 , G03F7/004 , G03F7/20
摘要： A salt represented by formula (I): wherein R1 and R2 each independently represent a hydroxy group, —O—R10, —O—CO—O—R10 or —O-L1-CO—O—R10; L1 represents an alkanediyl group having 1 to 6 carbon atoms; R4, R5, R7 and R8 each independently represent a halogen atom, an alkyl fluoride group having 1 to 12 carbon atoms or a hydrocarbon group having 1 to 18 carbon atoms, the hydrocarbon group may have a substituent, and —CH2— included in the hydrocarbon group may be replaced by —O—, —CO—, —S— or —SO2—; R10 represents an acid-labile group; X1 and X2 each independently represent an oxygen atom or a sulfur atom; m1 represents an integer of 1 to 5, m2 and m8 represent an integer of 0 to 5, m4, m5 and m7 represent an integer of 0 to 4; and AI− represents an organic anion.
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5.发明申请公开(公告)号：US20180373146A1
公开(公告)日：2018-12-27
申请号：US16014836
申请日：2018-06-21
摘要： A compound represented by the formula (I):
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公开(公告)号：US20220372012A1
公开(公告)日：2022-11-24
申请号：US17717305
申请日：2022-04-11
发明人： Katsuhiro KOMURO , Jun OGUMA , Koji ICHIKAWA
IPC分类号： C07D335/10 , G03F7/004 , G03F7/039 , G03F7/32 , G03F7/40 , G03F7/38 , C07D333/54 , C07D307/77
摘要： Provided are a salt capable of producing a resist pattern with satisfactory CD Uniformity (CDU), an acid generator, and a resist composition. Disclosed are a salt represented by formula (I), an acid generator, and a resist composition: wherein, in formula (I), R4, R5, R6, R7, R8 and R9 each represent a halogen atom, a haloalkyl group, etc.; A1, A2 and A3 each represent a hydrocarbon group, etc.; m1 and m4, m5, m6 and m7 represent an integer of 0 to 5, m2, m3, m8 and m9 represent an integer of 0 to 4, 0≤m1+m7≤5, 0≤m2+m8≤4, 0≤m3+m9≤4, and at least one of m1, m2 and m3 represents an integer of 1 or more; X4 represents a single bond, —CH2—, —O—, —S—, —CO—, —SO— or —SO2—; and AI− represents an organic anion.
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公开(公告)号：US20200159116A1
公开(公告)日：2020-05-21
申请号：US16684945
申请日：2019-11-15
发明人： Katsuhiro KOMURO , Yuki TAKAHASHI , Koji ICHIKAWA
IPC分类号： G03F7/004 , C07D333/76 , G03F7/038 , G03F7/039 , C08F212/14 , C08F220/18
摘要： A salt is represented by formula (I). In formula (I), R1, R2 and R3 each independently represent a halogen atom, a perfluoroalkyl group having 1 to 6 carbon atoms or a hydrocarbon group having 1 to 12 carbon atoms, and —CH2— included in the hydrocarbon group may be replaced by —O— or —CO—, m1 represents an integer of 0 to 4, and when m1 is 2 or more, a plurality of R1 may be the same or different from each other, m2 represents an integer of 0 to 4, and when m2 is 2 or more, a plurality of R2 may be the same or different from each other, and m3 represents an integer of 0 to 4, and when m3 is 2 or more, a plurality of R3 may be the same or different from each other.
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公开(公告)号：US20180373149A1
公开(公告)日：2018-12-27
申请号：US16012993
申请日：2018-06-20
发明人： Katsuhiro KOMURO , Shingo FUJITA , Koji ICHIKAWA
摘要： A photoresist composition comprising a resin which comprises a structural unit represented by the formula (I): and a salt represented by the formula (B1):
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公开(公告)号：US20230266666A1
公开(公告)日：2023-08-24
申请号：US17896138
申请日：2022-08-26
发明人： Katsuhiro KOMURO , Saki KATO , Koji ICHIKAWA
IPC分类号： G03F7/004 , C07D307/00 , C07D333/76 , C07D321/10 , C07D409/12 , C08F220/18
CPC分类号： G03F7/0045 , C07D307/00 , C07D321/10 , C07D333/76 , C07D409/12 , C08F220/1808 , C08F220/1818
摘要： Disclosed are a salt represented by formula (I), an acid generator, and a resist composition including the same:
wherein R4 to R9 each represent a halogen atom, a haloalkyl group, etc., A1, A2 and A3 each represent a hydrocarbon group which may have a substituent, —CH2— included in the group may be replaced by —O—, —CO—, —S—, etc., X4, X5 and X6 each represent —O— or —S—, m1 and m7 represent an integer of 0 to 5, m2, m3, m8 and m9 represent an integer of 0 to 4, m4 to m6 represent an integer of 0 to 3, 0 ≤ m1 + m7 ≤ 5, 0 ≤ m2 + m8 ≤ 4, 0 ≤ m3 + m9 ≤ 4, one or more of m1, m2 and m3 represent an integer of 1 or more, X7 represents a single bond, —CH2—, —O—, —S—, etc., and Al— represents an organic anion.-
公开(公告)号：US20230139896A1
公开(公告)日：2023-05-04
申请号：US17896273
申请日：2022-08-26
发明人： Katsuhiro KOMURO , Saki KATO , Koji ICHIKAWA
IPC分类号： G03F7/004
摘要： Provided are a salt capable of producing a resist pattern with satisfactory CD uniformity (CDU), and a resist composition including the same. Disclosed are a salt represented by formula (I), an acid generator, and a resist composition including the same: wherein R4, R5, R7 and R8 each represent a halogen atom, a haloalkyl group, etc., A1 and A2 each represent a hydrocarbon group, the group may have a substituent, —CH2— in the group may be replaced by —O—, —CO—, —S—, —SO2—, etc., X3 and X4 each represent —O— or —S—, m1 present an integer of 1 to 5, m2 and m8 represent an integer of 0 to 5, m4 and m5 represent an integer of 0 to 3, m7 represent an integer of 0 to 4, 1≤m1+m7≤5, 0≤m2+m8≤5, and AI− represents an organic anion.
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