Invention Application
- Patent Title: LITHOGRAPHIC APPARATUS AND ELECTROSTATIC CLAMP DESIGNS
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Application No.: US17773004Application Date: 2020-10-05
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Publication No.: US20230008474A1Publication Date: 2023-01-12
- Inventor: Victor Antonio PEREZ-FALCON , Marcus Adrianus VAN DE KERKHOF , Daniel Leslie HALL , Christopher John MASON , Arthur Winfried Eduardus MINNAERT , Johannes Hubertus Josephina MOORS , Samir A. NAYFEH
- Applicant: ASML Holding N.V. , ASML Netherlands B.V.
- Applicant Address: NL Veldhoven; NL Veldhoven
- Assignee: ASML Holding N.V.,ASML Netherlands B.V.
- Current Assignee: ASML Holding N.V.,ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven; NL Veldhoven
- International Application: PCT/EP2020/077877 WO 20201005
- Main IPC: H02N13/00
- IPC: H02N13/00 ; G03F7/20

Abstract:
Embodiments herein describe methods, devices, and systems for reducing an electric field at a clamp-reticle interface using an enhanced electrostatic clamp. In particular, the electrostatic clamp includes a clamp body, an electrode layer disposed on a top surface of the clamp body, and a plurality of burls that project from a bottom surface of the clamp body, wherein the electrode layer comprises a plurality of cutouts at predetermined locations that vertically correspond to locations of the plurality of burls at the bottom surface of the clamp body.
Public/Granted literature
- US12174552B2 Lithographic apparatus and electrostatic clamp designs Public/Granted day:2024-12-24
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