Invention Application
- Patent Title: INTEGRATED WET CLEAN FOR EPITAXIAL GROWTH
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Application No.: US17859752Application Date: 2022-07-07
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Publication No.: US20230008695A1Publication Date: 2023-01-12
- Inventor: Brian K. Kirkpatrick , Uday Mitra
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Main IPC: H01L21/67
- IPC: H01L21/67 ; B08B13/00 ; B08B3/08 ; C30B25/02 ; C30B35/00

Abstract:
Exemplary integrated cluster tools may include a factory interface including a first transfer robot. The tools may include a wet clean system coupled with the factory interface at a first side of the wet clean system. The tools may include a load lock chamber coupled with the wet clean system at a second side of the wet clean system opposite the first side of the wet clean system. The tools may include a first transfer chamber coupled with the load lock chamber. The first transfer chamber may include a second transfer robot. The tools may include a dry etch chamber coupled with the first transfer chamber. The tools may include a second transfer chamber coupled with the first transfer chamber. The second transfer chamber may include a third transfer robot. The tools may include a process chamber coupled with the second transfer chamber.
Information query
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