Invention Application
- Patent Title: NON-VOLATILE MEMORY DEVICE AND NON-VOLATILE MEMORY SYSTEM COMPRISING THE SAME
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Application No.: US17702400Application Date: 2022-03-23
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Publication No.: US20230010192A1Publication Date: 2023-01-12
- Inventor: Jung-Hwan Lee , Jin-Soo Lim
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Priority: KR10-2021-0089412 20210708
- Main IPC: H01L23/544
- IPC: H01L23/544 ; H01L27/11556 ; H01L27/11529 ; H01L27/11582 ; H01L27/11573

Abstract:
A non-volatile memory device and a non-volatile memory system comprising the same are provided. The non-volatile memory device includes a first stack in which a first conductive pattern and a first dielectric layer are alternately stacked in a first direction on a substrate, a second stack in which a second conductive pattern and a second dielectric layer are alternately stacked in the first direction on the first stack opposite the substrate, a first monitoring channel structure that penetrates the first stack in the first direction, and a second monitoring channel structure that penetrates the second stack in the first direction and is =on the first monitoring channel structure. A width of a top of the first monitoring channel structure opposite the substrate is smaller than a width of a bottom of the second monitoring channel structure adjacent the top of the first monitoring channel structure.
Information query
IPC分类: