Invention Publication
- Patent Title: STABILITY-ENHANCED ORGANOTIN PHOTORESIST COMPOSITIONS
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Application No.: US17982013Application Date: 2022-11-07
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Publication No.: US20230143592A1Publication Date: 2023-05-11
- Inventor: Kai Jiang , Alan J. Telecky , Stephen T. Meyers
- Applicant: Inpria Corporation
- Applicant Address: US OR Corvallis
- Assignee: Inpria Corporation
- Current Assignee: Inpria Corporation
- Current Assignee Address: US OR Corvallis
- Main IPC: G03F7/004
- IPC: G03F7/004

Abstract:
An organotin precursor solution is described comprising an organic solvent, an optional additive, and an organotin composition represented by one or more organotin compounds represented by the formula RSnL3, wherein each R is independently a hydrocarbyl ligand having from 1 to 31 carbon atoms and each L is independently a hydrolysable ligand, wherein the total concentration of Sn is from about 0.001 M to about 0.5 M. The solvent can comprises a linear alcohol with from 1 to 6 carbon atoms, and the organotin precursor solution can have an initial water content from about 100 ppm to about 10,000 ppm, in which the organotin precursor solution has a reduced rate of water dissipation relative to an equivalent organotin precursor solution formed with 4-methyl-2-pentanol. The organotin precursor solutions can be prepared through the selection of an appropriate stabilizing compound, which can be a linear, short chain alcohol and an appropriate additive.
Information query
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