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公开(公告)号：US20250085627A1
公开(公告)日：2025-03-13
申请号：US18830797
申请日：2024-09-11
Applicant: Inpria Corporation
Inventor： Brian J. Cardineau , Robert E. Jilek , Kai Jiang , Alexander C. Marwitz
Abstract: Organotin patterning compositions can incorporate Sn—F bonds to improve pattering performance. A precursor solution for a radiation patterning composition can comprise a blend of an organic solvent, an organotin composition represented by the formula RSnL3, and a compound capable of generating Sn—F bonds wherein R is a substituted or unsubstituted hydrocarbyl ligand with 1 to 31 carbon atoms and an Sn—C bond and L is a hydrolysable ligand. The fluoride source can be an ammonium fluoride. The patterning structure on a substrate surface has RSnFn moieties, generally within an oxo-hydroxo network.
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公开(公告)号：US20240376135A1
公开(公告)日：2024-11-14
申请号：US18779539
申请日：2024-07-22
Applicant: Inpria Corporation
Inventor： Brian J. Cardineau , William Earley , Stephen T. Meyers , Kai Jiang , Jeremy T. Anderson
Abstract: Patterning compositions are described based on organo tin dodecamers with hydrocarbyl ligands, oxo ligands, hydroxo ligands and carboxylato ligands. Alternative dodecamer embodiments have organo tin ligands in place of hydrocarbyl ligands. The organo tin ligands can be incorporated into the dodecamers from a monomer with the structure (RCC)3SnQ, where R is a hydrocarbyl group and Q is a alkyl tin moiety with a carbon bonded to the Sn atom of the monomer and with a Sn bonded as a replacement of a quaternary carbon atom with bonds to 4 carbon atoms. Some or all of the carboxylato and hydroxyl ligands can be replaced with fluoride ions. Good EUV patterning results are obtained with the dodecamer based patterning compositions.
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公开(公告)号：US11809081B2
公开(公告)日：2023-11-07
申请号：US17832920
申请日：2022-06-06
Applicant: Inpria Corporation
Inventor： Stephen T. Meyers , Jeremy T. Anderson , Brian J. Cardineau , Joseph B. Edson , Kai Jiang , Douglas A. Keszler , Alan J. Telecky
IPC: G03F7/16 , G03F7/004 , G03F7/38 , C23C16/40 , C23C14/08 , C23C16/455 , G03F7/30 , G03F7/20 , G03F7/32 , G03F7/40
CPC classification number: G03F7/168 , C23C14/086 , C23C16/407 , C23C16/45523 , C23C16/45561 , G03F7/0042 , G03F7/0043 , G03F7/162 , G03F7/167 , G03F7/2004 , G03F7/30 , G03F7/325 , G03F7/38 , G03F7/40
Abstract: Organometallic precursors are described for the formation of high resolution lithography patterning coatings based on metal oxide hydroxide chemistry. The precursor compositions generally comprise ligands readily hydrolysable by water vapor or other OH source composition under modest conditions. The organometallic precursors generally comprise a radiation sensitive organo ligand to tin that can result in a coating that can be effective for high resolution patterning at relatively low radiation doses and is particularly useful for EUV patterning. The precursors compositions are readily processable under commercially suitable conditions. Solution phase processing with in situ hydrolysis or vapor based deposition can be used to form the coatings.
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公开(公告)号：US20230004090A1
公开(公告)日：2023-01-05
申请号：US17939328
申请日：2022-09-07
Applicant: Inpria Corporation
Inventor： Stephen T. Meyers , Jeremy T. Anderson , Brian J. Cardineau , Joseph B. Edson , Kai Jiang , Douglas A. Keszler , Alan J. Telecky
IPC: G03F7/16 , G03F7/38 , C23C16/40 , C23C14/08 , G03F7/004 , C23C16/455 , G03F7/20 , G03F7/32 , G03F7/40
Abstract: Organometallic precursors are described for the formation of high resolution lithography patterning coatings based on metal oxide hydroxide chemistry. The precursor compositions generally comprise ligands readily hydrolysable by water vapor or other OH source composition under modest conditions. The organometallic precursors generally comprise a radiation sensitive organo ligand to tin that can result in a coating that can be effective for high resolution patterning at relatively low radiation doses and is particularly useful for EUV patterning. The precursors compositions are readily processable under commercially suitable conditions. Solution phase processing with in situ hydrolysis or vapor based deposition can be used to form the coatings.
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公开(公告)号：US11537048B2
公开(公告)日：2022-12-27
申请号：US16987120
申请日：2020-08-06
Applicant: Inpria Corporation
Inventor： Stephen T. Meyers , Jeremy T. Anderson , Brian J. Cardineau , Joseph B. Edson , Kai Jiang , Douglas A. Keszler , Alan J. Telecky
IPC: G03F7/16 , C23C14/08 , G03F7/38 , C23C16/40 , G03F7/004 , C23C16/455 , G03F7/20 , G03F7/32 , G03F7/40
Abstract: Organometallic precursors are described for the formation of high resolution lithography patterning coatings based on metal oxide hydroxide chemistry. The precursor compositions generally comprise ligands readily hydrolysable by water vapor or other OH source composition under modest conditions. The organometallic precursors generally comprise a radiation sensitive organo ligand to tin that can result in a coating that can be effective for high resolution patterning at relatively low radiation doses and is particularly useful for EUV patterning. The precursors compositions are readily processable under commercially suitable conditions. Solution phase processing with in situ hydrolysis or vapor based deposition can be used to form the coatings.
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Patent Agency Ranking
6.发明授权公开(公告)号：US11098070B2
公开(公告)日：2021-08-24
申请号：US16194491
申请日：2018-11-19
Applicant: Inpria Corporation
Inventor： Brian J. Cardineau , Stephen T. Meyers , Kai Jiang , William Earley , Jeremy T Anderson
Abstract: Organotin clusters are described with the formula R3Sn3(O2CR′)5-x(OH)2+x(μ3-O) with 0≤x
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公开(公告)号：US20200326627A1
公开(公告)日：2020-10-15
申请号：US16845511
申请日：2020-04-10
Applicant: Inpria Corporation
Inventor： Kai Jiang , Brian J. Cardineau , Lauren B. McQuade , Jeremy T. Anderson , Stephen T. Meyers , Michael Kocsis , Amrit K. Narasimhan
Abstract: Developer compositions are described based on blends of solvents, in which the developers are particularly effective for EUV patterning using organometallic based patterning compositions. Methods for use of these developing compositions are described. The blends of solvents can be selected based on Hansen solubility parameters. Generally, one solvent has low polarity as express by the sum of δP+δH, and a second solvent component of the developer has a higher value of δP+δH. Corresponding solvent compositions are described.
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8.发明申请公开(公告)号：US20200209756A1
公开(公告)日：2020-07-02
申请号：US16810924
申请日：2020-03-06
Applicant: Inpria Corporation
Inventor： Mollie Waller , Brian J. Cardineau , Kai Jiang , Alan J. Telecky , Stephen T. Meyers , Benjamin L. Clark
Abstract: Apparatuses and methods are described for removing edge bead on a wafer associated with a resist coating comprising a metal containing resist compositions. The methods can comprise applying a first bead edge rinse solution along a wafer edge following spin coating of the wafer with the metal based resist composition, wherein the edge bead solution comprises an organic solvent and an additive comprising a carboxylic acid, an inorganic fluorinated acid, a tetraalkylammonium compound, or a mixture thereof. Alternatively or additionally, the methods can comprise applying a protective composition to the wafer prior to performing an edge bead rinse. The protective composition can be a sacrificial material or an anti-adhesion material and can be applied only to the wafer edge or across the entire wafer in the case of the protective composition. Corresponding apparatuses for processing the wafers using these methods are presented.
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公开(公告)号：US20150056542A1
公开(公告)日：2015-02-26
申请号：US13973098
申请日：2013-08-22
Applicant: Inpria Corporation
Inventor： Stephen T. Meyers , Douglas A. Keszler , Kai Jiang , Jeremy Anderson , Andrew Grenville
CPC classification number: G03F7/0042 , G03F7/0043 , G03F7/09 , G03F7/20 , G03F7/2002 , G03F7/2037 , G03F7/30 , G03F7/32 , G03F7/322 , G03F7/325
Abstract: Organometallic solutions have been found to provide high resolution radiation based patterning using thin coatings. The patterning can involve irradiation of the coated surface with a selected pattern and developing the pattern with a developing agent to form the developed image. The patternable coatings may be susceptible to positive-tone patterning or negative-tone patterning based on the use of an organic developing agent or an aqueous acid or base developing agent. The radiation sensitive coatings can comprise a metal oxo/hydroxo network with organic ligands. A precursor solution can comprise an organic liquid and metal polynuclear oxo-hydroxo cations with organic ligands having metal carbon bonds and/or metal carboxylate bonds.
Abstract translation: 已经发现有机金属溶液使用薄涂层提供高分辨率的基于辐射的图案化。 图案化可以包括用选定图案照射涂覆表面，并用显影剂显影图案以形成显影图像。 基于使用有机显影剂或酸性或碱性显影剂水溶液，可图案化的涂层可能对正色调图案化或负色调图案敏感。 辐射敏感涂层可以包含具有有机配体的金属氧代/羟基网络。 前体溶液可以包含具有金属碳键和/或金属羧酸盐键的有机配体的有机液体和金属多核氧代 - 羟基阳离子。
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10.发明授权公开(公告)号：US12129271B2
公开(公告)日：2024-10-29
申请号：US17380475
申请日：2021-07-20
Applicant: Inpria Corporation
Inventor： Brian J. Cardineau , Stephen T. Meyers , Kai Jiang , William Earley , Jeremy T. Anderson
CPC classification number: C07F7/2224 , G03F7/0042 , G03F7/2004 , G03F7/325 , C07B2200/13
Abstract: Organotin clusters are described with the formula R3Sn3(O2CR′)5−x(OH)2+x(μ3-O) with 0≤x
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