• Patent Title: SCENT RETAINING STRUCTURE, METHOD OF MANUFACTURING THE SCENT RETAINING STRUCTURE, AND SCENT PROVIDING DEVICE
  • Application No.: US18097857
    Application Date: 2023-01-17
  • Publication No.: US20230149587A1
    Publication Date: 2023-05-18
  • Inventor: Yukito INOUE
  • Applicant: Sony Corporation
  • Applicant Address: JP Tokyo
  • Assignee: Sony Corporation
  • Current Assignee: Sony Corporation
  • Current Assignee Address: JP Tokyo
  • Priority: JP 17177297 2017.09.15
  • Main IPC: A61L9/12
  • IPC: A61L9/12
SCENT RETAINING STRUCTURE, METHOD OF MANUFACTURING THE SCENT RETAINING STRUCTURE, AND SCENT PROVIDING DEVICE
Abstract:
The present disclosure provides a perfume retaining structure, a method of manufacturing the perfume retaining structure, and a scent providing device that can reduce ventilation resistance of air that passes through a space in which a perfume retainer is arranged.
The perfume retaining structure includes the perfume retainer, a retaining space in which the perfume retainer is arranged, and a first opening and a second opening that allow the retaining space to be opened to the outside. The retaining space has a ventilation area that faces the first opening and the second opening, and a retaining area that is arranged adjacent to the ventilation area and communicates with the ventilation area, and the perfume retainer is arranged in the retaining area.
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