Invention Publication
- Patent Title: FOCUS ASSESSMENT IN DYNAMICALLY FOCUSED LASER SYSTEM
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Application No.: US17986755Application Date: 2022-11-14
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Publication No.: US20230152574A1Publication Date: 2023-05-18
- Inventor: Jay Small , Ken Gross
- Applicant: NLIGHT, INC.
- Applicant Address: US WA Camas
- Assignee: NLIGHT, INC.
- Current Assignee: NLIGHT, INC.
- Current Assignee Address: US WA Camas
- Main IPC: G02B26/10
- IPC: G02B26/10

Abstract:
Some embodiments may include a method assessing whether a dynamic focus module in a three axis galvanometric scanning system (three-axis GSS) is associated with a focus calibration error. The method may include identifying a reference layer associated with a surface of the work piece and positive and negative offset distances each a difference distance above or below the reference layer, respectively, and selecting a target pattern based on the offset distances, wherein the pattern includes an individual line for each offset distance. The method may include commanding the three-axis GSS to draw the target pattern on the work piece, and then assessing whether the dynamic focus module is associated with the focus calibration error by correlating laser marking artifacts on the work piece to ones of the individual lines of the selected pattern. Other embodiments may be disclosed and/or claimed.
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