Invention Publication
- Patent Title: RECESS STRUCTURE FOR PADLESS STACK VIA
-
Application No.: US17455576Application Date: 2021-11-18
-
Publication No.: US20230154829A1Publication Date: 2023-05-18
- Inventor: Hong Bok WE , Joan Rey Villarba BUOT , Aniket PATIL
- Applicant: QUALCOMM Incorporated
- Applicant Address: US CA San Diego
- Assignee: QUALCOMM Incorporated
- Current Assignee: QUALCOMM Incorporated
- Current Assignee Address: US CA San Diego
- Main IPC: H01L23/48
- IPC: H01L23/48 ; H01L21/768

Abstract:
Disclosed is a stack via structure in which a plurality of vias are stacked over each other. At least one via is a via that has a recess formed from a top surface thereof. Another via above the via is formed such that a bottom portion of the another via is in the recess of the via. In this way, no capture pad is needed between the via and the another via. Also, contact area between the via and the another via is enhanced.
Public/Granted literature
- US12230552B2 Recess structure for padless stack via Public/Granted day:2025-02-18
Information query
IPC分类: