Invention Publication
- Patent Title: SYSTEMS AND METHODS OF ELECTRON BEAM INDUCED PROCESSING
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Application No.: US18158666Application Date: 2023-01-24
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Publication No.: US20230158520A1Publication Date: 2023-05-25
- Inventor: Andrei G. Fedorov
- Applicant: Georgia Tech Research Corporation
- Applicant Address: US GA Atlanta
- Assignee: Georgia Tech Research Corporation
- Current Assignee: Georgia Tech Research Corporation
- Current Assignee Address: US GA Atlanta
- The original application number of the division: US17223620 2021.04.06
- Main IPC: B05B5/16
- IPC: B05B5/16 ; B82Y10/00 ; C23C18/14 ; B05B5/035 ; B05D1/04 ; B05D3/06

Abstract:
Embodiments of the present disclosure provide for methods and systems for making structures using an electrospray system while under vacuum. In particular, embodiments of the present disclosure provide for methods and systems for ultra-fast growth of high aspect ratio nano/meso/micro-structures with three dimensional topological complexity and control of phase and composition of the structure formed.
Public/Granted literature
- US12059698B2 Systems and methods of electron beam induced processing Public/Granted day:2024-08-13
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