Invention Publication
- Patent Title: CHARACTERIZATION OF AN ELECTRON BEAM
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Application No.: US18155314Application Date: 2023-01-17
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Publication No.: US20230176239A1Publication Date: 2023-06-08
- Inventor: Per TAKMAN , Tomi TUOHIMAA , Ulf LUNDSTRÖM
- Applicant: Excillum AB
- Applicant Address: SE Kista
- Assignee: Excillum AB
- Current Assignee: Excillum AB
- Current Assignee Address: SE Kista
- Priority: EP 209895.2 2019.11.19
- Main IPC: G01T1/34
- IPC: G01T1/34

Abstract:
A method for characterizing an electron beam in a liquid metal jet X-ray source. The method includes providing the electron beam and directing the electron beam to an interaction region; providing an electron beam dump connected to ground potential for receiving the electron beam after it has traversed the interaction region; scanning the electron beam over at least part of the interaction region; measuring X-ray radiation generated by interaction between the electron beam and the electron beam dump during the scanning to obtain an X-ray profile; and calculating an electron beam characteristic based on the X-ray profile. Also, a corresponding liquid metal jet X-ray source.
Public/Granted literature
- US11892576B2 Characterization of an electron beam Public/Granted day:2024-02-06
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