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公开(公告)号：US20230238204A1
公开(公告)日：2023-07-27
申请号：US17923259
申请日：2021-04-29
Applicant: Excillum AB
Inventor： Björn HANSSON , Julius HÅLLSTEDT , Tomi TUOHIMAA , Ulf LUNDSTRÖM , Daniel NILSSON
CPC classification number: H01J35/153 , H01J35/30 , G01N23/04 , G01N2223/204
Abstract: An X-ray imaging system, including a target; an electron beam source configured to provide an electron beam for interaction with the target to generate X-ray radiation; electron optics configured to alternately direct the electron beam to at least a first and a second location on the target; an X-ray detector array configured to receive X-ray radiation generated at the first and second locations on the target; a sample position region for receiving a sample to be exposed to generated X-ray radiation, the sample position region being located in a region where X-ray radiation generated at the first location overlaps with X-ray radiation generated at the second location; and a processing unit coupled to the X-ray detector array, the processing unit being configured to create an image of a sample, positioned in the sample position region, based on the X-ray radiation originating from the first location and from the second location.
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公开(公告)号：US20220230832A1
公开(公告)日：2022-07-21
申请号：US17609655
申请日：2020-05-07
Applicant: Excillum AB
Inventor： Björn HANSSON , Per TAKMAN , Ulf LUNDSTRÖM , Tomi TUOHIMAA
Abstract: A liquid metal jet X-ray source including an electromagnetic pump for pumping the liquid metal. The electromagnetic pump includes a core having a core diameter and an outer yoke with a thickness of at least 20% of the core diameter. Preferably, the thickness of the outer yoke is at least 20% of the core diameter plus 6% of a radial distance between an outside of the core and an inside of the yoke.
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公开(公告)号：US20220028645A1
公开(公告)日：2022-01-27
申请号：US17297126
申请日：2019-12-17
Applicant: Excillum AB
Inventor： Tomi TUOHIMAA , Ulf LUNDSTRÖM , Björn HANSSON
Abstract: An X-ray source including a liquid target source configured to provide a liquid target in an interaction region of the X-ray source, an electron source adapted to provide an electron beam directed towards the interaction region, such that the electron beam interacts with the liquid target to generate X-ray radiation, and an electron collector arranged at a distance downstream of the interaction region, as seen along a travel direction of the electron beam. The electron collector includes an impact portion configured to absorb electrons of the electron beam impinging thereon, and the impact portion is arranged so as to be oblique with respect to the travel direction of the electron beam at the impact portion.
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公开(公告)号：US20230176239A1
公开(公告)日：2023-06-08
申请号：US18155314
申请日：2023-01-17
Applicant: Excillum AB
Inventor： Per TAKMAN , Tomi TUOHIMAA , Ulf LUNDSTRÖM
IPC: G01T1/34
CPC classification number: G01T1/34
Abstract: A method for characterizing an electron beam in a liquid metal jet X-ray source. The method includes providing the electron beam and directing the electron beam to an interaction region; providing an electron beam dump connected to ground potential for receiving the electron beam after it has traversed the interaction region; scanning the electron beam over at least part of the interaction region; measuring X-ray radiation generated by interaction between the electron beam and the electron beam dump during the scanning to obtain an X-ray profile; and calculating an electron beam characteristic based on the X-ray profile. Also, a corresponding liquid metal jet X-ray source.
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公开(公告)号：US20220404514A1
公开(公告)日：2022-12-22
申请号：US17777747
申请日：2020-11-12
Applicant: Excillum AB
Inventor： Per TAKMAN , Tomi TUOHIMAA , Ulf LUNDSTRÖM
IPC: G01T1/34
Abstract: A method for characterizing an electron beam in a liquid metal jet X-ray source. The method includes providing the electron beam and directing the electron beam to an interaction region; providing an electron beam dump connected to ground potential for receiving the electron beam after it has traversed the interaction region; scanning the electron beam over at least part of the interaction region; measuring X-ray radiation generated by interaction between the electron beam and the electron beam dump during the scanning to obtain an X-ray profile; and calculating an electron beam characteristic based on the X-ray profile. Also a corresponding liquid metal jet X-ray source.
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Patent Agency Ranking
公开(公告)号：US20210195724A1
公开(公告)日：2021-06-24
申请号：US17057192
申请日：2019-06-07
Applicant: Excillum AB
Inventor： Per TAKMAN , Ulf LUNDSTRÖM
Abstract: A method for controlling an X-ray source configured to emit, from an X-ray spot on a target, X-ray radiation generated by an interaction between an electron beam and the target, wherein the X-ray spot is determined by the field of view of an X-ray optical system of the X-ray source. The method includes providing the target, providing the electron beam forming an electron spot on the target and interacting with the target to generate X-ray radiation, and adjusting a width and total power of the electron beam such that a maximum of the power density profile in the electron spot is below a predetermined limit, and such that a total power delivered to the target in the X-ray spot is increased.
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公开(公告)号：US20240015875A1
公开(公告)日：2024-01-11
申请号：US18471588
申请日：2023-09-21
Applicant: Excillum AB
Inventor： Johan KRONSTEDT , Ulf LUNDSTRÖM , Per TAKMAN
IPC: H05G2/00
Abstract: X-ray sources including an electron source, an adjustment means for adjusting an orientation of the electron beam generated by the electron source, a focusing means configured to focus the electron beam in accordance with a focusing setting, a beam orientation sensor arranged to generate a signal indicating an orientation of the electron beam relative to a target position, and a controller that is operably connected to the focusing means, the beam orientation sensor and the adjustment means. Also, X-ray sources including a target orientation sensor and a target adjustment means, wherein the controller is configured to cause the beam adjustment means and/or target adjustment means to adjust the relative orientation between the electron beam and the target.
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公开(公告)号：US20230380786A1
公开(公告)日：2023-11-30
申请号：US18249442
申请日：2021-10-18
Applicant: Excillum AB
Inventor： Ulf LUNDSTRÖM
Abstract: An X-ray system is disclosed, including an electron-impact X-ray source configured to generate an X-ray beam; a radiation-shielded housing having an X-ray outlet port; an X-ray optical element arranged within the radiation-shielded housing configured to direct the X-ray beam toward the outlet port; a shutter arranged at the outlet port, the shutter being movable between an open position at which X-ray output through the outlet port is allowed, and a closed position at which X-ray output through the outlet port is prevented; and a detector arranged to detect X-ray radiation from the X-ray source directed towards the outlet port, wherein the detector is configured to detect X-ray radiation within a first energy range. A corresponding method of operating an X-ray system is also disclosed.
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公开(公告)号：US20220220951A1
公开(公告)日：2022-07-14
申请号：US17595064
申请日：2020-05-07
Applicant: Excillum AB
Inventor： Ulf LUNDSTRÖM , Björn HANSSON , Per TAKMAN , Tomi TUOHIMAA
Abstract: An electromagnetic pump for pumping an electrically conductive liquid, including a first conduit section and a second conduit section. The electromagnetic pump further includes a current generator arranged to provide an electric current through the liquid in the first conduit section and the liquid in the second conduit section such that a direction of the electric current is intersecting the flow of the liquid in the first conduit section and in the second conduit section, and a magnetic field generating arrangement arranged to provide a magnetic field passing through the liquid in the first conduit section and the second conduit section such that a direction of the magnetic field is intersecting the flow of the liquid and the direction of the electric current.
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公开(公告)号：US20210410260A1
公开(公告)日：2021-12-30
申请号：US17290580
申请日：2019-11-04
Applicant: Excillum AB
Inventor： Johan KRONSTEDT , Ulf LUNDSTRÖM , Per TAKMAN
Abstract: X-ray sources including an electron source, an adjustment means for adjusting an orientation of the electron beam generated by the electron source, a focusing means configured to focus the electron beam in accordance with a focusing setting, a beam orientation sensor arranged to generate a signal indicating an orientation of the electron beam relative to a target position, and a controller that is operably connected to the focusing means, the beam orientation sensor and the adjustment means. Also, X-ray sources including a target orientation sensor and a target adjustment means, wherein the controller is configured to cause the beam adjustment means and/or target adjustment means to adjust the relative orientation between the electron beam and the target.
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