Invention Application
- Patent Title: SUBSTRATE HOLDER AND SUBSTRATE PROCESSING APPARATUS
-
Application No.: US17811373Application Date: 2022-07-08
-
Publication No.: US20230018009A1Publication Date: 2023-01-19
- Inventor: Koichi SHIMADA
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Priority: JP2021-119079 20210719
- Main IPC: B65G1/14
- IPC: B65G1/14

Abstract:
A substrate holder includes a first boat configured to hold a substrate in a shelf-like manner, and a second boat coaxial with the first boat and provided to move up and down relative to the first boat. The second boat holds a substrate in a shelf-like manner. The first boat includes a first bottom plate and a first ceiling plate provided to face each other, a first support column connecting the first bottom plate and the first ceiling plate to each other, and a first placement surface on which the substrate is placed. The second boat includes a second bottom plate and a second ceiling plate provided to vertically face each other, a second support column connecting the second bottom plate and the second ceiling plate, and a second placement surface on which the substrate is placed. The second ceiling plate overlaps the first ceiling plate in a plan view.
Public/Granted literature
- US12234094B2 Substrate holder and substrate processing apparatus Public/Granted day:2025-02-25
Information query
IPC分类: