- 专利标题: SEMICONDUCTOR DEVICE, MEMORY CELL AND METHOD OF FORMING THE SAME
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申请号: US18161908申请日: 2023-01-31
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公开(公告)号: US20230180486A1公开(公告)日: 2023-06-08
- 发明人: Yu-Chao Lin , Tung-Ying Lee , Yuan-Tien Tu , Jung-Piao Chiu
- 申请人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 申请人地址: TW Hsinchu
- 专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人地址: TW Hsinchu
- 主分类号: H10B63/00
- IPC分类号: H10B63/00 ; H10N70/00
摘要:
A memory cell includes a bottom electrode, a memory element, spacers, a selector and a top electrode. The memory element is located on the bottom electrode and includes a first conductive layer, a second conductive layer and a storage layer. The first conductive layer is electrically connected to the bottom electrode. The second conductive layer is located on the first conductive layer, wherein a width of the first conductive layer is smaller than a width of the second conductive layer. The storage layer is located in between the first conductive layer and the second conductive layer. The spacers are located aside the second conductive layer and the storage layer. The selector is disposed on the spacers and electrically connected to the memory element. The top electrode is disposed on the selector.
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