- 专利标题： SEQUENTIAL INFILTRATION SYNTHESIS APPARATUS
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申请号： US18097559申请日： 2023-01-17
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公开(公告)号： US20230183856A1公开(公告)日： 2023-06-15
- 发明人: Ivo Johannes Raaijmakers , Jan Willem Maes , Werner Knaepen , Krzysztof Kamil Kachel
- 申请人： ASM IP Holding B.V.
- 申请人地址： NL Almere
- 专利权人： ASM IP Holding B.V.
- 当前专利权人： ASM IP Holding B.V.
- 当前专利权人地址： NL FL Almere
- 主分类号： C23C16/04
- IPC分类号： C23C16/04 ; H01L21/033 ; C23C16/448 ; C23C16/455 ; C23C16/44 ; C23C16/46 ; C23C16/52 ; G03F7/20 ; H01L21/02
摘要：
Examples of the disclosure relate to a sequential infiltration synthesis apparatus comprising:
a reaction chamber constructed and arranged to accommodate at least one substrate;
a first precursor flow path to provide the first precursor to the reaction chamber when a first flow controller is activated;
a second precursor flow path to provide a second precursor to the reaction chamber when a second flow controller is activated;
a removal flow path to allow removal of gas from the reaction chamber;
a removal flow controller to create a gas flow in the reaction chamber to the removal flow path
when the removal flow controller is activated; and,
a sequence controller operably connected to the first, second and removal flow controllers and the sequence controller being programmed to enable infiltration of an infiltrateable material provided on the substrate in the reaction chamber. The apparatus may be provided with a heating system.
a reaction chamber constructed and arranged to accommodate at least one substrate;
a first precursor flow path to provide the first precursor to the reaction chamber when a first flow controller is activated;
a second precursor flow path to provide a second precursor to the reaction chamber when a second flow controller is activated;
a removal flow path to allow removal of gas from the reaction chamber;
a removal flow controller to create a gas flow in the reaction chamber to the removal flow path
when the removal flow controller is activated; and,
a sequence controller operably connected to the first, second and removal flow controllers and the sequence controller being programmed to enable infiltration of an infiltrateable material provided on the substrate in the reaction chamber. The apparatus may be provided with a heating system.
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