发明申请
- 专利标题: Method for Preparing Array Substrate, Display Panel and Evaporation Apparatus
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申请号: US17953986申请日: 2022-09-27
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公开(公告)号: US20230019100A1公开(公告)日: 2023-01-19
- 发明人: Shujie Liu , Zhiyong Xue , Hailong Li , Lingling Ma , Hongyu Mi , Liangliang Liu
- 申请人: ORDOS YUANSHENG OPTOELECTRONICS CO., LTD. , BOE TECHNOLOGY GROUP CO., LTD.
- 申请人地址: CN Ordos; CN Beijing
- 专利权人: ORDOS YUANSHENG OPTOELECTRONICS CO., LTD.,BOE TECHNOLOGY GROUP CO., LTD.
- 当前专利权人: ORDOS YUANSHENG OPTOELECTRONICS CO., LTD.,BOE TECHNOLOGY GROUP CO., LTD.
- 当前专利权人地址: CN Ordos; CN Beijing
- 优先权: CN201811476207.0 20181204
- 主分类号: H01L27/12
- IPC分类号: H01L27/12 ; C23C14/04 ; C23C14/12 ; C23C14/24
摘要:
A method for preparing an array substrate, a display panel and an evaporation apparatus are disclosed. A method comprises: fixing a base substrate to an evaporation stage; attaching at least one shielding sheet to the base substrate to cover at least a preset area of the base substrate; arranging and aligning an open mask in association with the base substrate, wherein the open mask has at least one opening for vapor deposition, and the at least one shielding sheet is positioned corresponding to the at least one opening and each has an area that is less than an area of a corresponding opening to shield a portion of the corresponding opening, and wherein the portion of the corresponding opening is separate from a boundary of the corresponding opening; and evaporating to form an evaporation material layer on the base substrate, to which the shielding sheet is attached.
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