Measurement Method, Measurement Device, Measurement System, And Measurement Program
Abstract:
A measurement method includes: generating first measurement data based on observation data of an observation point of a structure; generating second measurement data by performing filter processing on the first measurement data; calculating a first deflection amount of the structure; calculating a second deflection amount by performing filter processing on the first deflection amount; approximating the second measurement data with a linear function of the second deflection amount to calculate a first-order coefficient and a zero-order coefficient; calculating a third deflection amount based on the first-order coefficient, the zero-order coefficient, and the second deflection amount; calculating an offset based on the zero-order coefficient, the second deflection amount, and the third deflection amount; and calculating a static response by adding the offset and a product of the first-order coefficient and the first deflection amount.
Information query
Patent Agency Ranking
0/0