- 专利标题: DEPOSITION DEVICE AND DEPOSITION METHOD
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申请号: US18152161申请日: 2023-01-10
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公开(公告)号: US20230220548A1公开(公告)日: 2023-07-13
- 发明人: Takanobu TAKENAKA , Atsushi TAKEDA
- 申请人: Japan Display Inc.
- 申请人地址: JP Tokyo
- 专利权人: Japan Display Inc.
- 当前专利权人: Japan Display Inc.
- 当前专利权人地址: JP Tokyo
- 优先权: JP 22003107 2022.01.12
- 主分类号: C23C16/455
- IPC分类号: C23C16/455 ; H10K71/10 ; H10K50/10 ; C23C16/448
摘要:
According to one embodiment, a deposition device includes a stage, a deposition head opposed to the stage, and a chamber accommodating the stage and the deposition head. The deposition head comprises a deposition source heating a material and generating vapor, a nozzle connected to the deposition source to emit the vapor generated by the deposition source, a control plate comprising a sleeve surrounding the nozzle, and a movement mechanism moving the control plate along an extension direction of the sleeve.
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