DEPOSITION DEVICE AND DEPOSITION METHOD
    1.
    发明公开

    公开(公告)号:US20240207891A1

    公开(公告)日:2024-06-27

    申请号:US18597956

    申请日:2024-03-07

    CPC classification number: B05D1/60 B05D1/36 H10K71/16 B05D2401/33

    Abstract: According to one embodiment, a deposition method includes preparing a processing substrate in which a lower electrode, a rib, and a partition including a lower portion and an upper portion arranged on the lower portion and protruding from a side surface of the lower portion are formed above a substrate, setting a spread angle of vapor of a first material emitted from a first deposition head to a first angle, and depositing the first material on the processing substrate, and setting a spread angle of vapor of a second material emitted from a second deposition head to a second angle larger than the first angle, and depositing the second material on the processing substrate on which the first material is deposited.

    MANUFACTURING METHOD OF DISPLAY DEVICE
    2.
    发明公开

    公开(公告)号:US20230371344A1

    公开(公告)日:2023-11-16

    申请号:US18313400

    申请日:2023-05-08

    Inventor: Atsushi TAKEDA

    CPC classification number: H10K59/871 H10K71/16 H10K71/233

    Abstract: According to an embodiment, a manufacturing method allows the manufacture of a display device including a partition including a lower portion provided on a rib including a pixel aperture and an upper portion protruding from a side surface of the lower portion. The method includes forming a lower electrode, forming a rib layer, forming a lower layer, forming an upper layer, forming a resist, forming the rib by a first etching process, forming the upper portion by a second etching process after the first etching process, and forming the lower portion by a third etching process after the second etching process.

    EVAPORATION DEVICE AND EVAPORATION METHOD
    4.
    发明公开

    公开(公告)号:US20230413655A1

    公开(公告)日:2023-12-21

    申请号:US18336036

    申请日:2023-06-16

    Inventor: Atsushi TAKEDA

    CPC classification number: H10K71/16

    Abstract: According to one embodiment, an evaporation device includes a first chamber group including a plurality of evaporation chambers arranged in line in a first conveyance direction, a second chamber group including a plurality of evaporation chambers arranged in line in a second conveyance direction, a first rotation chamber which is connected to a first evaporation chamber located at a upstream position in the first conveyance direction and a second evaporation chamber located at a downstream position in the second conveyance direction, and a second rotation chamber which is connected to a third evaporation chamber located at a downstream position in the first conveyance direction and a fourth evaporation chamber located at a upstream position in the second conveyance direction.

    DISPLAY DEVICE
    5.
    发明公开
    DISPLAY DEVICE 审中-公开

    公开(公告)号:US20230269991A1

    公开(公告)日:2023-08-24

    申请号:US18171762

    申请日:2023-02-21

    CPC classification number: H10K59/871

    Abstract: According to one embodiment, a display device includes first and second lower electrodes, a rib, a partition including a lower portion and an upper portion, a first organic layer disposed on the first lower electrode, a second organic layer disposed on the second lower electrode, a first upper electrode disposed on the first organic layer, a second upper electrode disposed on the second organic layer, a first sealing layer disposed above the first upper electrode, in contact with the lower portion and extending to above the upper portion and a second sealing layer disposed above the second upper electrode, in contact with the lower portion, extending to above the upper portion, and spaced apart from the first sealing layer.

    DEPOSITION DEVICE AND DEPOSITION METHOD
    6.
    发明公开

    公开(公告)号:US20230219114A1

    公开(公告)日:2023-07-13

    申请号:US18151482

    申请日:2023-01-09

    CPC classification number: B05D1/60 B05D1/36 H10K71/16 B05D2401/33

    Abstract: According to one embodiment, a deposition method includes preparing a processing substrate in which a lower electrode, a rib, and a partition including a lower portion and an upper portion arranged on the lower portion and protruding from a side surface of the lower portion are formed above a substrate, setting a spread angle of vapor of a first material emitted from a first deposition head to a first angle, and depositing the first material on the processing substrate, and setting a spread angle of vapor of a second material emitted from a second deposition head to a second angle larger than the first angle, and depositing the second material on the processing substrate on which the first material is deposited.

    DEPOSITION MASK
    7.
    发明申请
    DEPOSITION MASK 审中-公开

    公开(公告)号:US20190352765A1

    公开(公告)日:2019-11-21

    申请号:US16527717

    申请日:2019-07-31

    Abstract: A deposition mask according to an embodiment of the present invention includes: a mask main body including a pattern portion formed with a pattern opening, and a frame portion surrounding the pattern portion; a mask frame supporting the frame portion of the mask main body; and an intermediate member having a shape corresponding to the mask frame, the intermediate member being disposed between the mask main body and the mask frame. The mask main body and a first face of the intermediate member are joined together, and the mask frame and a face of the intermediate member on the side opposite to the first face are joined together.

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