- 专利标题: PARTICLE REMOVING ASSEMBLY AND METHOD OF CLEANING MASK FOR LITHOGRAPHY
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申请号: US18200951申请日: 2023-05-23
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公开(公告)号: US20230314963A1公开(公告)日: 2023-10-05
- 发明人: Chen-Yang LIN , Da-Wei YU , Li-Hsin WANG , Kuan-Wen LIN , Chia-Jen CHEN , Hsin-Chang LEE
- 申请人: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- 申请人地址: TW Hsinchu
- 专利权人: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- 当前专利权人: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- 当前专利权人地址: TW Hsinchu
- 主分类号: G03F7/20
- IPC分类号: G03F7/20 ; G03F1/82 ; G03F1/22
摘要:
A photolithographic apparatus includes a particle removing cassette, a pump and a compressor. The particle removing cassette includes a first slit that includes an array of parallel wind blade nozzles arranged along a length of the first slit, protruding from the first slit, and configured to eject and direct pressurized cleaning material to a patterning surface of a mask to remove debris particles on the patterning surface. The pump and the compressor are controlled by a controller to adjust a flow rate and a pressure of the pressurized cleaning material based on an amount of debris particles on the patterning surface of the mask.
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