发明申请
- 专利标题: DUAL-PORT SRAM
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申请号: US17872445申请日: 2022-07-25
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公开(公告)号: US20230035789A1公开(公告)日: 2023-02-02
- 发明人: Pinhan Chen , Chenglei Guo
- 申请人: Shanghai Huali Integrated Circuit Corporation
- 申请人地址: CN Shanghai
- 专利权人: Shanghai Huali Integrated Circuit Corporation
- 当前专利权人: Shanghai Huali Integrated Circuit Corporation
- 当前专利权人地址: CN Shanghai
- 优先权: CN202110848205.5 20210727
- 主分类号: H03K19/1776
- IPC分类号: H03K19/1776 ; H03K19/017 ; H03K19/0944
摘要:
The present application discloses a dual-port SRAM having two ports. On a layout, pass gates connecting to the two ports are disposed near pull down transistors of corresponding memory nodes. A cell layout structure of the SRAM cell structure is centrosymmetric. In a first subunit layout structure, a pass gate and a first pull down transistor share the same active region, and an active region of the other pull down transistor is disposed between active regions of the first pull down transistor and a first pull up transistor. The present application improves the symmetry of read paths of the two memory nodes from two ports thus the symmetry of read currents, therefore the variation of the electrical performance of PMOS transistors is reduced and the stability of the electrical performance of the PMOS transistors is improved.
公开/授权文献
- US12009818B2 Dual-port SRAM 公开/授权日:2024-06-11
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