- 专利标题: BLOCK COPOLYMER SELF-ALIGNMENT ON ISOLATED CHEMICAL STRIPES
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申请号: US17757887申请日: 2020-12-22
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公开(公告)号: US20230036175A1公开(公告)日: 2023-02-02
- 发明人: Michael Arnold , Robert Jacobberger , Paul F. Nealey , Shisheng Xiong , Tzu-Hsuan Chang , Zhenqiang Ma
- 申请人: Wisconsin Alumni Research Foundation , The University of Chicago
- 申请人地址: US WI Madison; US IL Chicago
- 专利权人: Wisconsin Alumni Research Foundation,The University of Chicago
- 当前专利权人: Wisconsin Alumni Research Foundation,The University of Chicago
- 当前专利权人地址: US WI Madison; US IL Chicago
- 国际申请: PCT/US2020/066693 WO 20201222
- 主分类号: C09D153/00
- IPC分类号: C09D153/00 ; G03F7/11 ; C08L53/00
摘要:
Methods of spatially directing the orientation and placement of multiple block copolymer (BCP) domains on isolated regions of a substrate are described. The methods involve epitaxially directing the assembly of BCP domains using spatial boundaries between regions with different surface composition, formed at the edges of isolated chemical regions on a background chemistry. Multiple vertical domains of BCP order on the isolated region, self-aligned in a direction parallel to edges of the isolated region. In some embodiments, vertical domains order on multiple isolated regions of a first chemistry of a chemical contrast pattern with horizontal domains on the regions of a second (background) chemistry of the chemical contrast pattern. Also provided herein are compositions resulting from the methods.