Invention Publication
- Patent Title: SEMICONDUCTOR MEASUREMENT APPARATUS
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Application No.: US18082040Application Date: 2022-12-15
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Publication No.: US20230375463A1Publication Date: 2023-11-23
- Inventor: Seoyeon JEONG , Seungwoo LEE , Inho SHIN , Wookrae KIM , Myungjun LEE , Jaehwang JUNG
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Priority: KR 20220061906 2022.05.20
- Main IPC: G01N21/21
- IPC: G01N21/21 ; G02B27/28 ; G01N21/956 ; G01B11/24

Abstract:
A semiconductor measurement apparatus includes an illumination unit configured to provide illumination light including linearly polarized light beams having different wavelengths, an optical unit including an objective lens configured to allow the illumination light to be incident on a sample, the optical unit being configured to transmit reflection light generated when the illumination light is reflected from the sample, a self-interference generator configured to self-interfere the reflection light transmitted from the optical unit and transmit the reflection light to a first image sensor, for each wavelength, and a controller. The controller is configured to process a measurement image output by the image sensor to divide the measurement image into a first image representing an intensity ratio of a polarization component of the reflection light and a second image representing a phase difference of the polarization component of the reflection light, for each wavelength.
Public/Granted literature
- US12222282B2 Semiconductor measurement apparatus Public/Granted day:2025-02-11
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