- 专利标题: DEPOSITION APPARATUS AND DEPOSITION PRODUCT MANUFACTURING METHOD
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申请号: US18070693申请日: 2022-11-29
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公开(公告)号: US20230098534A1公开(公告)日: 2023-03-30
- 发明人: Yukio Imaizumi
- 申请人: HOJITSU SEIKO CO., LTD.
- 申请人地址: JP Guifu
- 专利权人: HOJITSU SEIKO CO., LTD.
- 当前专利权人: HOJITSU SEIKO CO., LTD.
- 当前专利权人地址: JP Guifu
- 优先权: JP2020-194075 20201124
- 主分类号: C23C24/04
- IPC分类号: C23C24/04 ; B05B13/04 ; B05B13/02
摘要:
A deposition apparatus includes: discharge nozzles arranged at predetermined intervals in a processing compartment in a deposition chamber, wherein each of the discharge nozzles comprises a discharge port that discharges aerosolized particulates toward a corresponding surface treatment object; linear motor single-axis robots arranged at predetermined intervals in a direction perpendicular to a nozzle arrangement direction; and nozzle head units that each adjust a mutual distance between the discharge port and a surface of the corresponding surface treatment object based on a shape of the corresponding surface treatment object, the nozzle head units moving along the nozzle arrangement direction, and the nozzle head units being arranged in each of the linear motor single-axis robots.