- 专利标题： DEVICE FOR MEASURING DENSITY OF PLASMA, PLASMA PROCESSING SYSTEM, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE SAME
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申请号： US17874475申请日： 2022-07-27
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公开(公告)号： US20230102201A1公开(公告)日： 2023-03-30
- 发明人: Vladimir Vsevolodovich PROTOPOPOV , Vasily Grigorievich PASHKOVSKIY , Chansoo KANG , Youngdo KIM , Hoonseop KIM , Sangki NAM , Sejin OH , Changsoon LIM
- 申请人： SAMSUNG ELECTRONICS CO., LTD.
- 申请人地址： KR Suwon-si
- 专利权人： SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人： SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人地址： KR Suwon-si
- 优先权： KR10-2021-0128947 20210929
- 主分类号： H01J37/32
- IPC分类号： H01J37/32
摘要：
A device for measuring a density of plasma is provided. The device includes a first sensor configured to measure a microwave spectrum of an input port reflection parameter of plasma, the first sensor having a probe including a conductive material and a flat plate shape, and a second sensor configured to measure an optical signal generated from the plasma, the second sensor being configured to detect the optical signal through the probe of the first sensor.