Invention Application
- Patent Title: CYCLOHEPTATRIENE MOLYBDENUM (0) PRECURSORS FOR DEPOSITION OF MOLYBDENUM FILMS
-
Application No.: US18085006Application Date: 2022-12-20
-
Publication No.: US20230129073A1Publication Date: 2023-04-27
- Inventor: Andrea Leoncini , Paul Mehlmann , Nemanja Dordevic , Han Vinh Huynh , Doreen Wei Ying Yong
- Applicant: Applied Materials, Inc. , National University of Singapore
- Applicant Address: US CA Santa Clara; SG Singapore
- Assignee: Applied Materials, Inc.,National University of Singapore
- Current Assignee: Applied Materials, Inc.,National University of Singapore
- Current Assignee Address: US CA Santa Clara; SG Singapore
- Main IPC: C23C16/18
- IPC: C23C16/18 ; C23C16/40 ; C23C16/42 ; C23C16/32 ; C23C16/34 ; C23C16/455 ; C07F11/00

Abstract:
Molybdenum(0) coordination complexes comprising at least one cycloheptatriene ligand and optionally one or more neutral ligands which coordinate to the metal center by carbon, nitrogen or phosphorous are described. Methods for depositing molybdenum-containing films on a substrate are described. The substrate is exposed to a molybdenum precursor and a reactant to form the molybdenum-containing film (e.g., elemental molybdenum, molybdenum oxide, molybdenum carbide, molybdenum silicide, molybdenum nitride). The exposures can be sequential or simultaneous.
Information query
IPC分类: