发明申请
- 专利标题： SELECTIVE BLOCKING OF METAL SURFACES USING BIFUNCTIONAL SELF-ASSEMBLED MONOLAYERS
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申请号： US17971212申请日： 2022-10-21
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公开(公告)号： US20230132200A1公开(公告)日： 2023-04-27
- 发明人: Michael L. McSwiney , Bhaskar Jyoti Bhuyan , Mark Saly , Drew Phillips , Aaron Dangerfield , David Thompson , Kevin Kashefi , Xiangjin Xie
- 申请人： Applied Materials, Inc.
- 申请人地址： US CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 主分类号： H01L21/768
- IPC分类号： H01L21/768 ; H01L21/02 ; B05D1/00
摘要：
Methods for selectively depositing on metallic surfaces are disclosed. Some embodiments of the disclosure utilize a hydrocarbon having at least two functional groups selected from alkene, alkyne, ketone, hydroxyl, aldehyde, or combinations thereof to form a self-assembled monolayer (SAM) on metallic surfaces.
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