- 专利标题: Pellicle Frame, Pellicle, Exposure Original Plate with Pellicle and Exposure Method, and Method for Manufacturing Semiconductor Device or Liquid Crystal Display Board
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申请号: US17796145申请日: 2021-02-02
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公开(公告)号: US20230135575A1公开(公告)日: 2023-05-04
- 发明人: Yu Yanase
- 申请人: Shin-Etsu Chemical Co., Ltd.
- 申请人地址: JP Tokyo
- 专利权人: Shin-Etsu Chemical Co., Ltd.
- 当前专利权人: Shin-Etsu Chemical Co., Ltd.
- 当前专利权人地址: JP Tokyo
- 优先权: JP2020-016970 20200204
- 国际申请: PCT/JP2021/003614 WO 20210202
- 主分类号: G03F1/64
- IPC分类号: G03F1/64 ; G03F7/20
摘要:
The present invention provides a frame-shaped pellicle frame having an upper end surface on which a pellicle film is provided and a lower end surface facing a photomask, characterized in that the inner surface of the pellicle frame has a region where a roughness curve kurtosis (Rku) is 3.0 or less, and also provides a pellicle, an exposure original plate with a pellicle and an exposure method, and a method for manufacturing a semiconductor device or a liquid crystal display board. The present invention can provide a pellicle frame that prevents scattered light derived from the frame and facilitates inspection of foreign matter adhered to the frame surface, and can also provide a pellicle using the pellicle frame.