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公开(公告)号：US11480870B2
公开(公告)日：2022-10-25
申请号：US17158476
申请日：2021-01-26
发明人： Yu Yanase
摘要： The present invention is to provide a pellicle frame in a frame shape having an upper end face on which a pellicle film is to be arranged and a lower end face to face a photomask, which is characterized by being provided with a notched part from the outer side face toward inner side face of the lower end face; a pellicle including the pellicle frame as an element; and a method for peeling a pellicle from a photomask onto which the pellicle has been attached, which is characterized by inserting a peeling jig into a notched part from a side face of a pellicle frame, and moving the peeling jig in an upper end face direction of the pellicle frame in this state to peel off the pellicle from the photomask.
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公开(公告)号：US10712658B2
公开(公告)日：2020-07-14
申请号：US15878460
申请日：2018-01-24
发明人： Yuichi Hamada , Yu Yanase
IPC分类号： G03F1/64 , C09J133/04
摘要： There is provided a method for procuring an agglutinant structure or in particular an agglutinant layer, from an agglutinant material, which is laid on an end face of a pellicle frame for gluing the pellicle to a photomask, wherein the agglutinant material is processed into the agglutinant layer passing through one more stages wherein the material is under a helium gas atmosphere; the invention is also about a manufacturing method of a pellicle wherein the agglutinant layer is procured in the above described manner.
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公开(公告)号：US11054738B2
公开(公告)日：2021-07-06
申请号：US16700228
申请日：2019-12-02
发明人： Yu Yanase
摘要： A pellicle characterized by having an amount of released aqueous gas of 1×10−3 Pa·L/s or less per pellicle, an amount of released hydrocarbon-based gas of 1×10−5 Pa·L/s or less per pellicle in a range of measured mass number of 45 to 100 amu, and an amount of released hydrocarbon-based gas of 4×10−7 Pa·L/s or less per pellicle in a range of measured mass number of 101 to 200 amu, under vacuum after the pellicle has been left to stand for 10 minutes in an atmosphere of 23° C. and 1×10−3 Pa or less.
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公开(公告)号：US10935882B2
公开(公告)日：2021-03-02
申请号：US16127605
申请日：2018-09-11
发明人： Yu Yanase
摘要： The present invention is to provide a pellicle frame in a frame shape having an upper end face on which a pellicle film is to be arranged and a lower end face to face a photomask, which is characterized by being provided with a notched part from the outer side face toward inner side face of the lower end face; a pellicle including the pellicle frame as an element; and a method for peeling a pellicle from a photomask onto which the pellicle has been attached, which is characterized by inserting a peeling jig into a notched part from a side face of a pellicle frame, and moving the peeling jig in an upper end face direction of the pellicle frame in this state to peel off the pellicle from the photomask.
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5.发明授权公开(公告)号：US10053367B2
公开(公告)日：2018-08-21
申请号：US15808143
申请日：2017-11-09
发明人： Yu Yanase
IPC分类号： B44C1/22 , C03C15/00 , C03C25/68 , C23F1/00 , C01B32/184 , B05D1/00 , B05D3/02 , B05D3/10 , B82Y40/00 , B82Y30/00
CPC分类号： C01B32/184 , B05D1/005 , B05D3/0254 , B05D3/107 , B82Y30/00 , B82Y40/00 , G03F1/62 , Y10S977/734 , Y10S977/888 , Y10S977/892
摘要： There is provided a method for preparing a graphene film for pellicle, and also a method for making a pellicle using such graphene film: wherein a film-like graphene deposited on a base material is coated with a protective film, from which the base material is chemically removed by an etching liquid and then the protective film is chemically removed by a solvent whose surFace tension is lower than that of the etching liquid; the pellicle frame may be attached to the film-like graphene before the protective film is completely removed or thereafter.
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公开(公告)号：US09910349B2
公开(公告)日：2018-03-06
申请号：US15018137
申请日：2016-02-08
发明人： Jun Horikoshi , Yu Yanase
IPC分类号： G03F1/62 , G03F1/64 , C09J183/08 , C09J133/08
CPC分类号： G03F1/64 , C09J133/08 , C09J183/08 , G03F1/62
摘要： A pellicle is proposed in which the agglutinant layer which enables the pellicle to adhere to a photomask is doped with a de-foaming agent which depends on a reactive fluorine-modified silicone oil for its anti-foaming performance, and typically such reactive fluorine-modified silicone oil has a vinyl group at both ends of its molecular chain.
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公开(公告)号：US20230135575A1
公开(公告)日：2023-05-04
申请号：US17796145
申请日：2021-02-02
发明人： Yu Yanase
摘要： The present invention provides a frame-shaped pellicle frame having an upper end surface on which a pellicle film is provided and a lower end surface facing a photomask, characterized in that the inner surface of the pellicle frame has a region where a roughness curve kurtosis (Rku) is 3.0 or less, and also provides a pellicle, an exposure original plate with a pellicle and an exposure method, and a method for manufacturing a semiconductor device or a liquid crystal display board. The present invention can provide a pellicle frame that prevents scattered light derived from the frame and facilitates inspection of foreign matter adhered to the frame surface, and can also provide a pellicle using the pellicle frame.
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公开(公告)号：US20230117335A1
公开(公告)日：2023-04-20
申请号：US17793461
申请日：2021-01-15
发明人： Yu Yanase
IPC分类号： G03F1/64
摘要： Provided are a pellicle frame, a pellicle, a method for inspecting a pellicle, a pellicle-attached exposure original plate and exposure method, and a method for manufacturing a semiconductor or a liquid crystal display board.
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公开(公告)号：US11592739B2
公开(公告)日：2023-02-28
申请号：US17556440
申请日：2021-12-20
发明人： Yu Yanase
IPC分类号： G03F1/64
摘要： The present invention is to provide a pellicle frame in a frame shape, having an upper end face to arrange a pellicle film thereon and a lower end face to face a photomask, and which is characterized by being provided with a notched part from an outer side face toward an inner side face of the upper end face, and to provide a pellicle characterized by including the pellicle frame as a component.
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公开(公告)号：US10761421B2
公开(公告)日：2020-09-01
申请号：US15991372
申请日：2018-05-29
发明人： Yu Yanase
摘要： A pellicle film for photolithography that is a pellicle film to be stretched over one end face of a pellicle frame, and is characterized by including a polymer film, and a gas impermeable layer formed on one side or both sides of the polymer film, and a pellicle for photolithography provided with the pellicle film.
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