Methods and apparatuses for managing objects are provided. A method performed by an electronic device includes monitoring, using an ultra-wide band (UWB) sensor of the electronic device, at least one object over a time period; based on the monitoring of the at least one object, extracting a variation in at least one of a material property parameter of the at least one object and a motion parameter of the at least one object; generating a pattern based on the variation in the at least one of the material property parameter and the motion parameter; and identifying, based on the generated pattern, an anomaly of the at least one object.