Invention Application
- Patent Title: PHOTOELECTRIC DETECTION SUBSTRATE AND MANUFACTURING METHOD THEREOF, AND PHOTOELECTRIC DETECTION DEVICE
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Application No.: US17432422Application Date: 2021-02-22
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Publication No.: US20230138242A1Publication Date: 2023-05-04
- Inventor: Kui LIANG , Tuo SUN , Yichi ZHANG
- Applicant: Beijing BOE Technology Development Co., Ltd. , BOE Technology Group Co., Ltd.
- Applicant Address: CN Beijing; CN Beijing
- Assignee: Beijing BOE Technology Development Co., Ltd.,BOE Technology Group Co., Ltd.
- Current Assignee: Beijing BOE Technology Development Co., Ltd.,BOE Technology Group Co., Ltd.
- Current Assignee Address: CN Beijing; CN Beijing
- Priority: CN202010199954.5 20200320
- International Application: PCT/CN2021/077213 WO 20210222
- Main IPC: H01L31/0224
- IPC: H01L31/0224 ; H01L31/042 ; H01L31/18
Abstract:
A photoelectric detection substrate and a manufacturing method thereof, and a photoelectric detection device are provided. The photoelectric detection substrate includes: a base substrate and a semiconductor layer arranged on the base substrate, wherein the semiconductor layer is configured to convert an optical signal into an electrical signal.
Public/Granted literature
- US12080812B2 Photoelectric detection substrate and manufacturing method thereof, and photoelectric detection device Public/Granted day:2024-09-03
Information query
IPC分类:
