PLASMA ETCHING METHOD

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US20240006186A1 PLASMA ETCHING METHOD 审中-公开

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Patent Title: PLASMA ETCHING METHOD
Application No.: US18036932

Application Date: 2021-07-28
Publication No.: US20240006186A1

Publication Date: 2024-01-04
Inventor: Chang-Koo KIM , Jun-Hyun KIM , Sang-Hyun YOU
Applicant: Ajou University Industry-Academic Cooperation Foundation
Applicant Address: KR Suwon-si, Gyeonggi-do
Assignee: Ajou University Industry-Academic Cooperation Foundation
Current Assignee: Ajou University Industry-Academic Cooperation Foundation
Current Assignee Address: KR Suwon-si, Gyeonggi-do
Priority: KR 20200151781 2020.11.13
International Application: PCT/KR2021/009755 2021.07.28
Date entered country: 2023-05-15
Main IPC: H01L21/311
IPC: H01L21/311 ; H01J37/32

Abstract:

Disclosed is a plasma etching method. The method includes a first step of vaporizing liquid heptafluoropropyl methyl ether (HFE-347mcc3) and liquid pentafluoropropanol (PFP); a second step of supplying a discharge gas containing the vaporized HFE-347mcc3, the vaporized PFP, and argon gas to a plasma chamber in which an etching target is disposed; and a third step of discharging the discharge gas to generate plasma and of plasma-etching the etching target using the generated plasma.

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IPC分类:

H	电学
H01	基本电气元件
H01L	半导体器件；其他类目中不包括的电固体器件（使用半导体器件的测量入G01；一般电阻器入H01C；磁体、电感器、变压器入H01F；一般电容器入H01G；电解型器件入H01G9/00；电池组、蓄电池入H01M；波导管、谐振器或波导型线路入H01P；线路连接器、汇流器入H01R；受激发射器件入H01S；机电谐振器入H03H；扬声器、送话器、留声机拾音器或类似的声机电传感器入H04R；一般电光源入H05B；印刷电路、混合电路、电设备的外壳或结构零部件、电气元件的组件的制造入H05K；在具有特殊应用的电路中使用的半导体器件见应用相关的小类）
H01L21/00	专门适用于制造或处理半导体或固体器件或其部件的方法或设备
H01L21/02	.半导体器件或其部件的制造或处理
H01L21/04	..至少具有一个跃变势垒或表面势垒的器件，例如PN结、耗尽层、载体集结层
H01L21/18	...器件有由周期表Ⅳ族元素或含有/不含有杂质的AⅢBⅤ族化合物构成的半导体，如掺杂材料
H01L21/30	....用H01L21/20至H01L21/26各组不包含的方法或设备处理半导体材料的（在半导体材料上制作电极的入H01L21/28）
H01L21/31	.....在半导体材料上形成绝缘层的，例如用于掩膜的或应用光刻技术的（密封层入H01L21/56）；以及这些层的后处理；这些层的材料的选择
H01L21/3105	......后处理
H01L21/311	.......绝缘层的刻蚀