The present disclosure provides a manufacturing method of a metal mesh, a thin film sensor and a manufacturing method of the thin film sensor, and belongs to the technical field of electronic devices. The manufacturing method of the metal mesh of the present disclosure includes: providing a base substrate; forming a pattern including a first epitaxial structure on the base substrate through a patterning process, wherein the first epitaxial structure has a first groove in a mesh shape; forming a first dielectric layer covering on a side of the first epitaxial structure away from the base substrate, so as to form a second groove in a mesh shape; and forming a metal material in the second groove on a side of the first dielectric layer away from the base substrate through a patterning process, so as to form a metal mesh.