Invention Publication
- Patent Title: SEMICONDUCTOR DEVICE AND METHOD OF FORMING THE SAME
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Application No.: US18501360Application Date: 2023-11-03
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Publication No.: US20240074206A1Publication Date: 2024-02-29
- Inventor: Fu-Chen CHANG , Kuo-Chi TU , Tzu-Yu CHEN , Sheng-Hung SHIH
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- The original application number of the division: US16727673 2019.12.26
- Main IPC: H10B51/30
- IPC: H10B51/30 ; G11C11/22 ; H10B51/10 ; H10B53/00 ; H10B53/30

Abstract:
A semiconductor device includes a random access memory (RAM) structure and a dielectric layer. The RAM structure is over a substrate and includes a bottom electrode layer, a ferroelectric layer over the bottom electrode layer, and a top electrode layer over the ferroelectric layer. The dielectric layer is over the substrate and laterally surrounds a lower portion of the RAM structure. From a cross-sectional view, the bottom electrode layer of the RAM structure has a lateral portion and a vertical portion, and the vertical portion upwardly extends from the lateral portion to a position higher than a top surface of the dielectric layer.
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